反应详情

Trimethylsilylmethyl methacrylate (TMSMMA) and tertiarybutyl methacrylate (TBMA) were mixed at a ratio of 1:1 so as to prepare a toluene solution having a monomer concentration of 5.0 mol/liter. Next, 2 mol %, on the basis of the monomer, of AIBN was added to the mixture, and the mixture was retained in an oil bath at 80° C. for 15 minutes. Next, the mixture was left standing to cool to room temperature. After the mixture was diluted with toluene, it was dropped into large quantities of a mixed solvent of water and methanol having a mixing ratio of 1:20, and the resulting precipitate was filtered and dried to obtain a base polymer of a resist material. There was thus obtained a trimethylsilylmethyl methacrylate/tertiarybutyl methacrylate copolymer represented by the following formula, ##STR12## wherein each of m and n is a positive integer. In this example, the copolymer described above could be obtained at a yield of 80%, the molecular weight was 38,000 and the dispersion was 1.70.

1. waitNext, the mixture was left
2. filtrationthe resulting precipitate was filtered
3. customdried
4. customto obtain a base polymer of a resist material