HuagongsheHuagongshe Chemistry Print Report · For research reference only
Trifluoroacetic acid → HCID 20729825, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Trifluoroacetic acid | HCID 6422 | — |
| Reactant | HCID 69637393 | HCID 69637393 | — |
| Solvent | Dichloromethane | HCID 6344 | — |
| Product | HCID 20729825 | HCID 20729825 | — |
Reaction Steps
38 mg of the compound of step b) were dissolved in 1.5 ml of dichloromethane, and 1.5 ml of trifluoroacetic acid were added. After stirring for 5 hours at ambient temperature additional 0.1 ml of trifluoroacetic acid were added and stirring was continued for further 1.5 hours. The solvents were removed in vacuo, the residue was dissolved in acetic acid and again the solvent was removed in vacuo. The remaining resin was triturated with diethylether and the product isolated by filtration. Yield: 29 mg. MS (ES+): m/e=563.1 (M+H)+.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06743800B1 |
| Source dataset | uspto-grants-2004_06 |
| ORD ID | ord-b957508b5da54129808751eafcd9f094 |
| Source note | uspto-grants-2004_06 |