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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 351652Generated: October 30, 2026

Trifluoroacetic acid → HCID 20729825, compound

https://huagongshe.com/reaction/351652

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantHCID 69637393HCID 69637393—
SolventDichloromethaneHCID 6344—
ProductHCID 20729825HCID 20729825—

Reaction Steps

38 mg of the compound of step b) were dissolved in 1.5 ml of dichloromethane, and 1.5 ml of trifluoroacetic acid were added. After stirring for 5 hours at ambient temperature additional 0.1 ml of trifluoroacetic acid were added and stirring was continued for further 1.5 hours. The solvents were removed in vacuo, the residue was dissolved in acetic acid and again the solvent was removed in vacuo. The remaining resin was triturated with diethylether and the product isolated by filtration. Yield: 29 mg. MS (ES+): m/e=563.1 (M+H)+.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06743800B1
Source datasetuspto-grants-2004_06
ORD IDord-b957508b5da54129808751eafcd9f094
Source noteuspto-grants-2004_06