Trifluoroacetic acid → HCID 20729825, compound
Reaction equation
C([O:5][C:6](=[O:44])[C@@H:7]([NH:34][S:35]([C:38]1[CH:43]=[CH:42][CH:41]=[CH:40][CH:39]=1)(=[O:37])=[O:36])[CH2:8][N:9]1[CH:17]=[N:16][C:15]2[C:10]1=[N:11][CH:12]=[N:13][C:14]=2[N:18]1[CH2:23][CH2:22][CH:21]([C:24]2[CH:33]=[CH:32][C:31]3[CH2:30][CH2:29][CH2:28][NH:27][C:26]=3[N:25]=2)[CH2:20][CH2:19]1)(C)(C)C.FC(F)(F)C(O)=O>ClCCl>[C:38]1([S:35]([NH:34][C@@H:7]([CH2:8][N:9]2[CH:17]=[N:16][C:15]3[C:10]2=[N:11][CH:12]=[N:13][C:14]=3[N:18]2[CH2:23][CH2:22][CH:21]([C:24]3[CH:33]=[CH:32][C:31]4[CH2:30][CH2:29][CH2:28][NH:27][C:26]=4[N:25]=3)[CH2:20][CH2:19]2)[C:6]([OH:44])=[O:5])(=[O:36])=[O:37])[CH:43]=[CH:42][CH:41]=[CH:40][CH:39]=1Participants
4
Reactant 2
Product 1
Reagents, catalysts & solvents 1
Procedure
38 mg of the compound of step b) were dissolved in 1.5 ml of dichloromethane, and 1.5 ml of trifluoroacetic acid were added. After stirring for 5 hours at ambient temperature additional 0.1 ml of trifluoroacetic acid were added and stirring was continued for further 1.5 hours. The solvents were removed in vacuo, the residue was dissolved in acetic acid and again the solvent was removed in vacuo. The remaining resin was triturated with diethylether and the product isolated by filtration. Yield: 29 mg. MS (ES+): m/e=563.1 (M+H)+.
Workup
- additionwere added
- customThe solvents were removed in vacuo
- dissolutionthe residue was dissolved in acetic acid
- customagain the solvent was removed in vacuo
- customThe remaining resin was triturated with diethylether
- customthe product isolated by filtration
Sources & evidence
- ORD record
- ord-b957508b5da54129808751eafcd9f094
- Source dataset
- uspto-grants-2004_06
- Patent number
- US06743800B1
Reaction notes
Loading…