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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 353200Generated: October 30, 2026

Trifluoroacetic acid → HCID 22708205, compound

https://huagongshe.com/reaction/353200

Reaction equation

Participants

RoleNameHCIDCharge
ReactantTrifluoroacetic acidHCID 6422—
ReactantHCID 22708262HCID 22708262—
SolventDichloromethaneHCID 6344—
ProductHCID 22708205HCID 22708205—

Reaction Steps

0.842 g (1.49 mmol) of the compound from Example 3-7 is initially charged in 10 ml of dichloromethane. At room temperature, 10 ml of trifluoroacetic acid are added. The reaction mixture is stirred at room temperature for 2 hours. The mixture is then concentrated under reduced pressure using a rotary evaporator. The residue is taken up in ethyl acetate and washed with water, 20% strength sodium acetate solution, water and saturated sodium chloride solution. The organic phase is dried over magnesium sulphate and freed from the solvent under reduced pressure. The product is purified chromatographically on silica gel (dichloromethane/methanol 30:1) and then dried under reduced pressure. This gives 0.648 g (85% of theory) of the title compound.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06750236B2
Source datasetuspto-grants-2004_06
ORD IDord-c8f434500fd64fa2a82535bef78088e6
Source noteuspto-grants-2004_06