Trifluoroacetic acid → HCID 22708205, compound

HRID 353200Notes

Reaction equation

HRID 353200 reaction equation
[CH3:1][O:2][CH2:3][CH2:4][N:5]([CH2:23][C:24]1[CH:40]=[CH:39][C:27]([O:28][C:29]([CH3:38])([CH3:37])[C:30]([O:32]C(C)(C)C)=[O:31])=[CH:26][CH:25]=1)[CH2:6][C:7]([NH:9][C:10]1[CH:15]=[CH:14][C:13]([CH:16]([CH3:18])[CH3:17])=[CH:12][C:11]=1[C:19]([F:22])([F:21])[F:20])=[O:8].FC(F)(F)C(O)=O>ClCCl>[CH3:1][O:2][CH2:3][CH2:4][N:5]([CH2:23][C:24]1[CH:25]=[CH:26][C:27]([O:28][C:29]([CH3:38])([CH3:37])[C:30]([OH:32])=[O:31])=[CH:39][CH:40]=1)[CH2:6][C:7]([NH:9][C:10]1[CH:15]=[CH:14][C:13]([CH:16]([CH3:18])[CH3:17])=[CH:12][C:11]=1[C:19]([F:22])([F:21])[F:20])=[O:8]

Participants

4

Reactant 2

HCID 6422Trifluoroacetic acidHCID 22708262HCID 22708262, compound

Product 1

HCID 22708205HCID 22708205, compound

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

0.842 g (1.49 mmol) of the compound from Example 3-7 is initially charged in 10 ml of dichloromethane. At room temperature, 10 ml of trifluoroacetic acid are added. The reaction mixture is stirred at room temperature for 2 hours. The mixture is then concentrated under reduced pressure using a rotary evaporator. The residue is taken up in ethyl acetate and washed with water, 20% strength sodium acetate solution, water and saturated sodium chloride solution. The organic phase is dried over magnesium sulphate and freed from the solvent under reduced pressure. The product is purified chromatographically on silica gel (dichloromethane/methanol 30:1) and then dried under reduced pressure. This gives 0.648 g (85% of theory) of the title compound.

Workup

  1. concentrationThe mixture is then concentrated under reduced pressure
  2. customa rotary evaporator
  3. washwashed with water, 20% strength sodium acetate solution, water and saturated sodium chloride solution
  4. dry with materialThe organic phase is dried over magnesium sulphate
  5. customThe product is purified chromatographically on silica gel (dichloromethane/methanol 30:1)
  6. customdried under reduced pressure

Sources & evidence

ORD record
ord-c8f434500fd64fa2a82535bef78088e6
Source dataset
uspto-grants-2004_06
Patent number
US06750236B2

Reaction notes

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