HCID 15434320, compound → HCID 21224732, compound
Reaction equation
[C:1]1([C:7]2([C:13]3[N:14]=[N:15][N:16]([CH2:18][CH2:19][CH2:20][C:21]4[CH:26]=[CH:25][CH:24]=[CH:23][CH:22]=4)[N:17]=3)[CH2:12][CH2:11][NH:10][CH2:9][CH2:8]2)[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.[C:27]([OH:33])([C:29]([F:32])([F:31])[F:30])=[O:28].C(Cl)Cl>>[F:30][C:29]([F:32])([F:31])[C:27]([OH:33])=[O:28].[C:1]1([C:7]2([C:13]3[N:14]=[N:15][N:16]([CH2:18][CH2:19][CH2:20][C:21]4[CH:22]=[CH:23][CH:24]=[CH:25][CH:26]=4)[N:17]=3)[CH2:12][CH2:11][NH:10][CH2:9][CH2:8]2)[CH:2]=[CH:3][CH:4]=[CH:5][CH:6]=1Participants
3
Procedure
The resin 15 (0.075 mmol) is treated with 10%, TFA/CH2Cl2 (2.5 mL) at room temperature for 4.5 hours and filtered. The resin is rinsed with CH2Cl2 (2×3 mL), MeOH (2×3 mL), and the combined filtrates are evaporated and dried to afford 16.
Workup
- filtrationfiltered
- washThe resin is rinsed with CH2Cl2 (2×3 mL), MeOH (2×3 mL)
- customthe combined filtrates are evaporated
- customdried
Sources & evidence
- ORD record
- ord-d4ed61f2b3184ab5a81f5c8b174ca05d
- Source dataset
- uspto-grants-1999_02
- Patent number
- US05869579
Reaction notes
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