HuagongsheHuagongshe Chemistry Print Report · For research reference only
HCID 15434320, compound → HCID 21224732, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | HCID 15434320 | HCID 15434320 | — |
| Reactant | Trifluoroacetic acid methylene chloride | HCID 21863450 | — |
| Product | HCID 21224732 | HCID 21224732 | — |
Reaction Steps
The resin 15 (0.075 mmol) is treated with 10%, TFA/CH2Cl2 (2.5 mL) at room temperature for 4.5 hours and filtered. The resin is rinsed with CH2Cl2 (2×3 mL), MeOH (2×3 mL), and the combined filtrates are evaporated and dried to afford 16.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US05869579 |
| Source dataset | uspto-grants-1999_02 |
| ORD ID | ord-d4ed61f2b3184ab5a81f5c8b174ca05d |
| Source note | uspto-grants-1999_02 |