Chlorotrimethylsilane → HCID 18630190, compound

HRID 376689Notes

Reaction equation

[CH2:1]([NH:3][C:4](=[O:15])[C:5]1[CH:10]=[CH:9][CH:8]=[C:7]([C:11]([F:14])([F:13])[F:12])[CH:6]=1)[CH3:2].[CH3:16][Si:17](Cl)([CH3:19])[CH3:18]>>[CH2:1]([NH:3][C:4](=[O:15])[C:5]1[CH:6]=[C:7]([C:11]([F:12])([F:14])[F:13])[CH:8]=[CH:9][C:10]=1[Si:17]([CH3:19])([CH3:18])[CH3:16])[CH3:2]

Participants

Reactant 2

HCID 6397Chlorotrimethylsilane

HCID 17683089HCID 17683089, compound

Product 1

HCID 18630190HCID 18630190, compound

Procedure

This amide was reacted with TMSCl (1.3 eq) as in Example 221 to afford the title compound. The crude product was purified by RC (ethyl acetate/hexanes) and recrystallization from pentane (-78° C.) to afford 0.14 g (5%) of the title compound as a white solid. m.p. 101°-102° C.

Sources & evidence

ORD record: ord-4f4f05b5bb5244e79cb1ecf1862f228d
Source dataset: uspto-grants-2000_02
DOI: 10.6084/m9.figshare.5104873.v1
Patent number: USRE036562

Reaction notes

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