HRID386609

反应详情

EQUATION

反应方程式

HRID 386609 的结构方程式

AUXILIARIES

试剂、催化剂与溶剂

2

CONDITIONS

反应条件

温度
0 °C

PROCEDURE

实验过程

To a solution of N,2-dimethylpropan-2-amine (16.0 mg, 0.189 mmol) and triethylamine (19.1 mg, 0.189 mmol) in DCM (1.5 mL), cooled to 0° C., was added triphosgene (19.0 mg, 0.0640 mmol), followed by additional triethylamine (28.7 mg, 0.284 mmol). After 10 minutes of stirring at 0° C., the ice bath was removed and the reaction was allowed to warm to ambient temperature. After 45 minutes at ambient temperature the reaction was cooled to 0° C. prior to the introduction of a chilled (0° C.), DCM (1 mL) solution of triethylamine (19.1 mg, 0.189 mmol) and N-(3,5-difluorobenzyl)-2-{[(4S)-3-methyl-2,5-dioxo-1′,3′-dihydrospiro[imidazolidine-4,2′-inden]-5′-yl]amino}-2-oxoethanaminium chloride (85.0 mg, 0.189 mmol, Intermediate 1). The ice bath was allowed to slowly melt overnight as the reaction warmed to ambient temperature. The reaction was then diluted with EtOAc (50 mL) and then washed with 1M HCl (50 mL, twice), half-saturated brine (50 mL) and saturated brine (50 mL). After drying over sodium sulfate, filtration and concentration in vacuo gave a residue which was applied to a silica gel column for purification, eluting with DCM:MeOH—99:1 to 90:10. The product containing factions were pooled and concentrated in vacuo to give a residue that was not of sufficient purity. This residue was applied to a second silica gel column for purification, eluting with DCM:MeOH—99:1 to 95:5. The product containing factions were pooled and concentrated in vacuo to give 30 mg of the title compound. MS: m/z=550 (M+23(Na+)). HRMS: m/z=528.2428; calculated m/z=528.2417 for C27H32N5O4F2.

WORKUP

后处理

  1. customthe ice bath was removed
  2. temperatureto warm to ambient temperature
  3. temperatureAfter 45 minutes at ambient temperature the reaction was cooled to 0° C.
  4. temperaturewarmed to ambient temperature
  5. washwashed with 1M HCl (50 mL
  6. dry with materialAfter drying over sodium sulfate, filtration and concentration in vacuo
  7. customgave a residue which
  8. customwas applied to a silica gel column for purification
  9. washeluting with DCM
  10. additionThe product containing factions
  11. concentrationconcentrated in vacuo
  12. customto give a residue that
  13. customThis residue was applied to a second silica gel column for purification
  14. washeluting with DCM
  15. additionThe product containing factions
  16. concentrationconcentrated in vacuo