Sulfuric Acid → HCID 57134866, compound

HRID 429471Notes

Reaction equation

HRID 429471 reaction equation
[H-].[Al+3].[Li+].[H-].[H-].[H-].S(=O)(=O)(O)O.[CH3:12][NH:13][C:14](=O)[C@H:15]([C:19]1[CH:24]=[CH:23][C:22]([Cl:25])=[C:21]([Cl:26])[CH:20]=1)[CH2:16][CH:17]=[CH2:18].ClCCl>O1CCCC1.CO.ClCCl>[CH3:12][NH:13][CH2:14][C@H:15]([C:19]1[CH:24]=[CH:23][C:22]([Cl:25])=[C:21]([Cl:26])[CH:20]=1)[CH2:16][CH:17]=[CH2:18]

Participants

7

Procedure

Cool a solution of lithium aluminum hydride (42.6 mL, 1.0 M in tetrahydrofuran, 42.6 mmol) to about −10° C. Add dropwise a solution of sulfuric acid (2.1 g) in tetrahydrofuran (5 mL) while maintaining the temperature of the reaction mixture at less than 0° C. After 20 minutes, warm to ambient temperature. Add a solution of (S)-2-(3,4-dichlorophenyl)pent-4-enoic acid, N-methyl amide (4.8 g, 18.8 mmol) and tetrahydrofuran (25 mL). After the addition is complete, heat the reaction mixture abbot t 35° C. After 15 hours, cool in an ice bath and carefully quench by the addition of water (5 mL) and tetrahydrofuran (5 mL). Add tetrahydrofuran (60 mL) and filter, and evaporate the filtrate in vacuo to give a residue. Combine the residue and dichloromethane, extract with water, dry over MgSO4, filter, and evaporate in vacuo to give a residue. Chromatograph the residue on silica gel eluting sequentially with 1% methanol/dichloromethane, 2% methanol/dichloromethane, 3% methanol/dichloromethane, and 4% methanol/dichloromethane to give (S)-N-methyl-(2-(3,4-dichlorophenyl)pent-4-enyl)amine: Rf=0.54 (silica gel, 9/1/0.1 dichloromethane/methanol/concentrated aqueous ammonia).

Workup

  1. temperaturewhile maintaining the temperature of the reaction mixture at less than 0° C
  2. additionAfter the addition
  3. temperatureheat the reaction mixture abbot t 35° C
  4. waitAfter 15 hours
  5. temperaturecool in an ice bath
  6. customcarefully quench by the addition of water (5 mL) and tetrahydrofuran (5 mL)
  7. filtrationAdd tetrahydrofuran (60 mL) and filter
  8. customevaporate the filtrate in vacuo
  9. customto give a residue
  10. extractionextract with water
  11. dry with materialdry over MgSO4
  12. filtrationfilter
  13. customevaporate in vacuo
  14. customto give a residue

Sources & evidence

ORD record
ord-3e263055ec0b4dd996fbe223d1145b06
Source dataset
uspto-grants-2001_11
Patent number
US06316445B1

Reaction notes

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