Hydrochloric Acid → HCID 131728822, 화합물

HRID 546679노트

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HRID 546679 반응식
[CH2:1]([Li])[CH2:2][CH2:3][CH3:4].[F:6][C:7]1[CH:12]=[CH:11][C:10]([CH2:13][C:14]([OH:16])=[O:15])=[CH:9][CH:8]=1.C1(C)C=CC(S(OC(C)CC[O:30][Si:31]([C:44]([CH3:47])([CH3:46])[CH3:45])([C:38]2[CH:43]=[CH:42][CH:41]=[CH:40][CH:39]=2)[C:32]2[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=2)(=O)=O)=CC=1.Cl>C1COCC1.C(OCC)(=O)C>[Si:31]([O:30][C:13]([C:10]1[CH:9]=[CH:8][C:7]([F:6])=[CH:12][CH:11]=1)([CH:2]([CH3:1])[CH2:3][CH3:4])[C:14]([OH:16])=[O:15])([C:44]([CH3:46])([CH3:45])[CH3:47])([C:38]1[CH:39]=[CH:40][CH:41]=[CH:42][CH:43]=1)[C:32]1[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=1

참가 물질

7

반응물 4

HCID 313Hydrochloric AcidHCID 98372-(4-Fluorophenyl)acetic acidHCID 86628506HCID 86628506, 화합물HCID 178418339Butyllithium

생성물 1

HCID 131728822HCID 131728822, 화합물

시약·촉매·용매 2

HCID 8028Tetrahydrofuran용매2회HCID 8857Ethyl Acetate용매

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온도
0 °C

실험 절차

n-Butyl lithium (4.89 mL; 2.66 M solution in hexane) was added dropwise to a solution of 4-fluorophenylacetic acid (1 g) in THF (30 mL) at −78° C., and the reaction solution was stirred for 20 minutes. The reaction solution was heated to 0° C. and stirred for 30 minutes. Then, a solution of 3-(tert-butyldiphenylsilanyloxy)-1-methylpropyl toluene-4-sulfonate (3.2 g) in THF (10 mL) was added dropwise to the reaction solution. The reaction solution was heated to room temperature and stirred at the same temperature for 12 hours. Then, 1 N hydrochloric acid and ethyl acetate were added to the reaction solution, and the organic layer was separated. The resulting organic layer was washed with brine, dried over anhydrous magnesium sulfate and then concentrated under reduced pressure. The residue was purified by silica gel column chromatography (elution solvent: heptane-ethyl acetate system) to obtain 986 mg of the title compound. The property values of the compound are as follows.

후처리

  1. stirringstirred for 30 minutes
  2. temperatureThe reaction solution was heated to room temperature
  3. stirringstirred at the same temperature for 12 hours
  4. customthe organic layer was separated
  5. washThe resulting organic layer was washed with brine
  6. dry with materialdried over anhydrous magnesium sulfate
  7. concentrationconcentrated under reduced pressure
  8. customThe residue was purified by silica gel column chromatography (elution solvent: heptane-ethyl acetate system)

출처 및 근거

ORD 기록
ord-ee6d14383f4445c6925f4ee3f1c97bc9
출처 데이터셋
uspto-grants-2011_05
특허 번호
US07935815B2

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