Triethylamine → HCID 66890038, compound
Reaction equation
[CH2:1]([O:8][C@H:9]([C@@H:29]([C@H:38]([CH2:51][O:52][CH2:53][C:54]1[CH:59]=[CH:58][CH:57]=[CH:56][CH:55]=1)[O:39]C(=O)C1C=CC([N+]([O-])=O)=CC=1)[O:30][CH2:31][C:32]1[CH:37]=[CH:36][CH:35]=[CH:34][CH:33]=1)[CH2:10][O:11][Si](C(C)(C)C)(C1C=CC=CC=1)C1C=CC=CC=1)[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1.C[O-].[Na+].C(N(CC)CC)C.F.F.F.C(N(CC)CC)C>CO>[CH2:1]([O:8][C@H:9]([C@@H:29]([C@H:38]([CH2:51][O:52][CH2:53][C:54]1[CH:55]=[CH:56][CH:57]=[CH:58][CH:59]=1)[OH:39])[O:30][CH2:31][C:32]1[CH:33]=[CH:34][CH:35]=[CH:36][CH:37]=1)[CH2:10][OH:11])[C:2]1[CH:7]=[CH:6][CH:5]=[CH:4][CH:3]=1Participants
Reactant 4
Product 1
Reagents, catalysts & solvents 1
Procedure
Compound 6 (110 g, 138.54 mmole) was dissolved in methanol (500 mL) and sodium methoxide (11 g, 204.0 mmole, 1.5 eq.) was added and the solution was stirred at room temperature for 2 hours. The reaction mixture was concentrated under reduced pressure, and the residue was partitioned between ether and water. The separated organic layer was washed with brine, dried over anhydrous sodium sulfate and concentrated under reduced pressure. The residue was dried in vacuo for 3 hrs and dissolved in dry THF under nitrogen. Triethylamine (TEA) (100 mL, 0.752 mole, 5 eq.) was added followed by triethylamine trihydrofluoride (TREAT.HF) (220 mL, 1.38 mole, 10 eq.) and the mixture was stirred overnight at room temperature. The solvent was removed under reduced pressure and the residue partitioned between ether and water. The ether layer was washed with brine and dried over anhydrous sodium sulfate. The solvent was removed under reduced pressure and the residue purified by flash chromatography (40% ethyl acetate in hexane) to give 51 g of compound 7 in 90% yield (reported literature yield 81%).
Workup
- concentrationThe reaction mixture was concentrated under reduced pressure
- customthe residue was partitioned between ether and water
- washThe separated organic layer was washed with brine
- dry with materialdried over anhydrous sodium sulfate
- concentrationconcentrated under reduced pressure
- customThe residue was dried in vacuo for 3 hrs
- dissolutiondissolved in dry THF under nitrogen
- stirringthe mixture was stirred overnight at room temperature
- customThe solvent was removed under reduced pressure
- customthe residue partitioned between ether and water
- washThe ether layer was washed with brine
- dry with materialdried over anhydrous sodium sulfate
- customThe solvent was removed under reduced pressure
- customthe residue purified by flash chromatography (40% ethyl acetate in hexane)
Sources & evidence
- ORD record
- ord-536b685c05cc4558b27816025207d108
- Source dataset
- uspto-grants-2011_05
- Patent number
- US07939677B2
Reaction notes
Loading…