Trifluoroacetic acid → HCID 178486625, compound

HRID 555631Notes

Reaction equation

HRID 555631 reaction equation
C(OC([N:8]1[C:12]([C:13]2[C:14]([CH3:26])=[N:15][N:16]([C:20]3[CH:25]=[CH:24][CH:23]=[CH:22][CH:21]=3)[C:17]=2[O:18][CH3:19])=[CH:11][C:10]([CH3:27])=[N:9]1)=O)(C)(C)C.C(OC(N1C(C)=CC(C2C(C)=NN(C3C=CC=CC=3)C=2OC)=N1)=O)(C)(C)C.FC(F)(F)C(O)=O>ClCCl>[CH3:19][O:18][C:17]1[N:16]([C:20]2[CH:21]=[CH:22][CH:23]=[CH:24][CH:25]=2)[N:15]=[C:14]([CH3:26])[C:13]=1[C:12]1[NH:8][N:9]=[C:10]([CH3:27])[CH:11]=1

Participants

5

Reactant 3

HCID 6422Trifluoroacetic acidHCID 59707148HCID 59707148, compoundHCID 59707176HCID 59707176, compound

Product 1

HCID 178486625HCID 178486625, compound

Reagents, catalysts & solvents 1

HCID 6344DichloromethaneSolvent

Procedure

To the mixture of O-methylated products, compounds (C) and (D) (0.013 g 0.035 mmol), in dichloromethane (1 ml) add trifluoroacetic acid (1 ml). Stir this mixture at room temperature for 1 hour, and then evaporate the mixture to dryness. Dilute the residue with dichloromethane, wash sequentially with water, aqueous sodium bicarbonate solution, and water. Dry the organic layer (sodium sulfate) and concentrate to give 0.006 g (0.022 mmol) of the title compound.

Workup

  1. customevaporate the mixture to dryness
  2. additionDilute the residue with dichloromethane
  3. washwash sequentially with water, aqueous sodium bicarbonate solution, and water
  4. dry with materialDry the organic layer (sodium sulfate)
  5. concentrationconcentrate

Sources & evidence

ORD record
ord-540f674ac86241349a9289b3b2c0d652
Source dataset
uspto-grants-2011_11
Patent number
US08053458B2

Reaction notes

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