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HuagongsheHuagongshe Chemistry Print Report · For research reference only
HRID 585767Generated: October 31, 2026

Chlorotrimethylsilane → HCID 22337994, compound

https://huagongshe.com/reaction/585767

Reaction equation

Participants

RoleNameHCIDCharge
ReactantChlorotrimethylsilaneHCID 6397—
ReactantDiisopropylamineHCID 7912—
ReactantTetrahydrofuranHCID 8028—
ReactantButyllithiumHCID 178418339—
ProductHCID 22337994HCID 22337994—

Reaction Steps

294 ml (0.45 ml) of butyllithium is added in drops at −35° C. under inert gas to 0.43 mol of diisopropylamine in 300 ml of THF. Then, 50 g (0.434 mol) of N,N-dimethyl-2-methylpropinoic acid amide is added in drops at 0° C. and stirred for 30 minutes at this temperature. Then, 60.3 ml (0.47 mol) of trimethylsilyl chloride is added at −35° C. and stirred for two more hours. The solvent is distilled off in a rotary evaporator. The residue is distilled in a vacuum at 65-69° C./30 mbar.

Provenance & Evidence

DOI10.6084/m9.figshare.5104873.v1
Patent numberUS06933385B2
Source datasetuspto-grants-2005_08
ORD IDord-eae479571c294c3999a95c5dbc12c1d7
Source noteuspto-grants-2005_08