HuagongsheHuagongshe Chemistry Print Report · For research reference only
Chlorotrimethylsilane → HCID 22337994, compound
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Chlorotrimethylsilane | HCID 6397 | — |
| Reactant | Diisopropylamine | HCID 7912 | — |
| Reactant | Tetrahydrofuran | HCID 8028 | — |
| Reactant | Butyllithium | HCID 178418339 | — |
| Product | HCID 22337994 | HCID 22337994 | — |
Reaction Steps
294 ml (0.45 ml) of butyllithium is added in drops at −35° C. under inert gas to 0.43 mol of diisopropylamine in 300 ml of THF. Then, 50 g (0.434 mol) of N,N-dimethyl-2-methylpropinoic acid amide is added in drops at 0° C. and stirred for 30 minutes at this temperature. Then, 60.3 ml (0.47 mol) of trimethylsilyl chloride is added at −35° C. and stirred for two more hours. The solvent is distilled off in a rotary evaporator. The residue is distilled in a vacuum at 65-69° C./30 mbar.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US06933385B2 |
| Source dataset | uspto-grants-2005_08 |
| ORD ID | ord-eae479571c294c3999a95c5dbc12c1d7 |
| Source note | uspto-grants-2005_08 |