Trifluoroacetic acid → HCID 117926533, compound
Reaction equation
FC(F)(F)C(O)=O.[Cl:8][C:9]1[CH:14]=[CH:13][N:12]=[C:11]2[N:15]([S:31]([C:34]3[CH:39]=[CH:38][C:37]([CH3:40])=[CH:36][CH:35]=3)(=[O:33])=[O:32])[C:16]([C:18]3[CH2:19][CH2:20][N:21](C(OC(C)(C)C)=O)[CH2:22][CH:23]=3)=[CH:17][C:10]=12>C(Cl)Cl>[Cl:8][C:9]1[CH:14]=[CH:13][N:12]=[C:11]2[N:15]([S:31]([C:34]3[CH:35]=[CH:36][C:37]([CH3:40])=[CH:38][CH:39]=3)(=[O:33])=[O:32])[C:16]([C:18]3[CH2:19][CH2:20][NH:21][CH2:22][CH:23]=3)=[CH:17][C:10]=12Participants
4
Reactant 2
Product 1
Reagents, catalysts & solvents 1
Procedure
Trifluoroacetic acid (5 mL) was added to a solution of P-5-I (2.4 g) in CH2Cl2 (20 mL) at 0° C. and the reaction mixture was stirred at room temperature for 3 h. After completion of the reaction, solvents were removed under reduced pressure and saturated NaHCO3 (60 mL) solution was added to the residue. Extraction was carried out using EtOAc (50 mL×3); the combined organic layers were washed with water (100 mL); brine (100 mL); dried over anhydrous Na2SO4, filtered and concentrated under reduced pressure. The residue obtained (1.9 g, quantitative) was used without any purification. LCMS: m/z; 388.2 (M+1)+.
Workup
- customAfter completion of the reaction, solvents
- customwere removed under reduced pressure and saturated NaHCO3 (60 mL) solution
- additionwas added to the residue
- extractionExtraction
- washthe combined organic layers were washed with water (100 mL)
- dry with materialdried over anhydrous Na2SO4
- filtrationfiltered
- concentrationconcentrated under reduced pressure
- customThe residue obtained (1.9 g, quantitative)
- customwas used without any purification
Sources & evidence
- ORD record
- ord-08eb5273cec844cb970b9fda53cb5a57
- Source dataset
- uspto-grants-2016_01
- Patent number
- US09233983B2
Reaction notes
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