HuagongsheHuagongshe Chemistry Print Report · For research reference only
Formaldehyde → Naphthalene
Participants
| Role | Name | HCID | Charge |
|---|---|---|---|
| Reactant | Formaldehyde | HCID 712 | — |
| Reactant | Oxalic Acid | HCID 971 | — |
| Reactant | Phenol | HCID 996 | — |
| Reactant | 1-Naphthaldehyde | HCID 6195 | — |
| Catalyst | p-Toluenesulfonic acid | HCID 6101 | — |
| Product | Naphthalene | HCID 931 | — |
Reaction Steps
100 Parts of a naphthaleneformaldehyde resin and 100 parts of phenol were reacted with each other in the presence of 0.1 part of p-toluenesulfonic acid as a catalyst at 140° C. for 2 hours. Then, 1 part of oxalic acid and 35 parts of 37% formalin were added, and the mixture was allowed to react at 100° C. for 2.5 hours. Thereafter, while the mixture was heated, it was subjected to dehydration treatment under reduced pressure. When the temperature reached 165° C., the dehydration under reduced pressure was terminated to give a brown opaque naphthalene.formaldehyde resin-modified novolak.phenolic resin having a softening point of 125° C. In this case, the amount of phenol in the distillate was about 4% based on the charged phenol amount.
Provenance & Evidence
| DOI | 10.6084/m9.figshare.5104873.v1 |
|---|---|
| Patent number | US05714544 |
| Source dataset | uspto-grants-1998_02 |
| ORD ID | ord-8591bcbdbf5a4e4abc015b1b0669e4a8 |
| Source note | uspto-grants-1998_02 |