Trifluoroacetic acid → HCID 67056761, compound
Reaction equation
[Cl:1][C:2]1[CH:3]=[C:4]2[C:8](=[CH:9][CH:10]=1)[NH:7][C:6]([C:11]([NH:13][C@H:14]1[C@H:18]([NH:19][C:20]([C:22]3[S:23][C:24]4[CH2:25][N:26]([CH3:31])[CH2:27][CH2:28][C:29]=4[N:30]=3)=[O:21])[CH2:17][N:16](C(OC(C)(C)C)=O)[CH2:15]1)=[O:12])=[CH:5]2.FC(F)(F)C(O)=O>C(Cl)Cl>[ClH:1].[Cl:1][C:2]1[CH:3]=[C:4]2[C:8](=[CH:9][CH:10]=1)[NH:7][C:6]([C:11]([NH:13][C@@H:14]1[CH2:15][NH:16][CH2:17][C@H:18]1[NH:19][C:20]([C:22]1[S:23][C:24]3[CH2:25][N:26]([CH3:31])[CH2:27][CH2:28][C:29]=3[N:30]=1)=[O:21])=[O:12])=[CH:5]2Participants
Reactant 2
Product 1
Reagents, catalysts & solvents 1
Procedure
The compound (170 mg) obtained in Example 94 was dissolved in methylene chloride (3 ml), and trifluoroacetic acid (2 ml) was added at room temperature to stir the mixture for 1 hour. After concentrating the reaction mixture, chloroform and a saturated aqueous solution of sodium hydrogencarbonate were added. The resultant organic layer was dried over anhydrous sodium sulfate, and the solvent was distilled off under reduced pressure. The resultant residue was purified by preparative thin-layer chromatography on silica gel (chloroform:methanol:water=7:3:1 under layer). A methanol solution of hydrochloric acid was added to the resultant intended product to obtain the title compound (90 mg) as a hydrochloride (NMR was measured in the form of a free base).
Workup
- concentrationAfter concentrating the reaction mixture, chloroform
- additiona saturated aqueous solution of sodium hydrogencarbonate were added
- dry with materialThe resultant organic layer was dried over anhydrous sodium sulfate
- distillationthe solvent was distilled off under reduced pressure
- customThe resultant residue was purified by preparative thin-layer chromatography on silica gel (chloroform:methanol:water=7:3:1 under layer)
- additionA methanol solution of hydrochloric acid was added to the resultant
Sources & evidence
- ORD record
- ord-2963b6b31af0491e97bef7d3974afbc2
- Source dataset
- uspto-grants-2008_04
- Patent number
- US07365205B2
Reaction notes
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