Methanol → HCID 54335129, Verbindung

HRID 1934496Notizen

Reaktionsgleichung

Reaktionsgleichung von HRID 1934496
O[CH2:2][C:3]([C:5]1[CH:10]=[CH:9][CH:8]=[CH:7][CH:6]=1)=[O:4].[F:11][C:12]1[CH:13]=[C:14]([CH:17]=[CH:18][C:19]=1[F:20])[CH:15]=O.C[O-:22].[Na+].CO>C(OC)(OC)OC>[F:11][C:12]1[CH:13]=[C:14]([CH:15]=[CH:2][C:3]([C:5]2[CH:6]=[CH:7][CH:8]=[CH:9][C:10]=2[OH:22])=[O:4])[CH:17]=[CH:18][C:19]=1[F:20]

Komponenten

6

Edukt 4

HCID 887MethanolHCID 68490alpha-HydroxyacetophenoneHCID 5880883,4-DifluorobenzaldehydeHCID 10942334Sodium Methoxide

Produkt 1

HCID 54335129HCID 54335129, Verbindung

Reagenzien, Katalysatoren, Lösungsmittel 1

HCID 9005Trimethyl orthoformateLösungsmittel

Versuchsvorschrift

A mixture of 2-hydroxyacetophenone on Wang resin (2.0 g, 1.76 mmol) was swelled in trimethyl orthoformate (20 mL) for 10 min. 3,4-Difluorobenzaldehyde (6.0 mmol) was added and 25% NaOMe in MeOH (0.86 g, 4.0 mmol) was added to the mixture dropwise over 30 min. The mixture was then stirred for an additional 0.5 h. The resin was filtered and washed with alternating MeOH and CH2Cl2 (×5) and dried under high vacuum overnight to give 2.17 g of 3-(3,4-difluorophenyl)-1-(2-hydroxyphenyl)-2-propen-1-one on Wang resin.

Aufarbeitung

  1. filtrationThe resin was filtered
  2. washwashed with alternating MeOH and CH2Cl2 (×5)
  3. customdried under high vacuum overnight

Quellen und Nachweise

ORD-Eintrag
ord-1f04fad7e51048bb9f00dac5369e5540
Quelldatensatz
uspto-grants-2002_05
Patentnummer
US06384057B1

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