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Sulfuric Acid → Dimethyl 4-cyclopentyl-2-oxobutylphosphonate

HRID 28785
Notes
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Reaction equation

HRID 28785 reaction equation
[CH3:1][P:2](=[O:7])([O:5][CH3:6])[O:3][CH3:4].[Li]CCCC.[CH:13]1([CH2:18][CH2:19][C:20](OC)=[O:21])[CH2:17][CH2:16][CH2:15][CH2:14]1.C1(CCC(O)=O)CCCC1.S(=O)(=O)(O)O>C1COCC1.CO>[CH:13]1([CH2:18][CH2:19][C:20](=[O:21])[CH2:1][P:2](=[O:7])([O:5][CH3:6])[O:3][CH3:4])[CH2:17][CH2:16][CH2:15][CH2:14]1
ParticipantsProcedureWorkupSources & evidenceReaction notes

Participants

8

Reactant 5

HCID 1118Sulfuric AcidHCID 8818Cyclopentanepropanoic acidHCID 12958Dimethyl methylphosphonateHCID 13033439Methyl 3-cyclopentylpropanoateHCID 178418339Butyllithium

Product 1

HCID 21525849Dimethyl 4-cyclopentyl-2-oxobutylphosphonateYield 82%

Reagents, catalysts & solvents 2

HCID 887MethanolSolventHCID 8028TetrahydrofuranSolvent

Procedure

To a solution of dimethyl methylphosphonate (2.17 ml, 20 mmol) in anhydrous THF (20 mL), cooled at −78° C. was added n-BuLi (1.6 M in hexane, 13.7 mL, 22 mmol). The mixture was stirred for 30 minutes at this temperature under nitrogen. Methyl 3-cyclopentylpropanoate (1.56 g, 10 mmol), prepared from 3-cyclopentylpropionic acid (Aldrich) and methanol at the presence of the catalytic amount of the concentrated sulfuric acid (the procedure described in Intermediate 17.1), was added dropwise for 10 minutes. The mixture was stirred for 2 hours at −78° C., gradually was warm to room temperature. The mixture was quenched with addition of 1N HCl to pH 4-5. The organic layer was separated, washed with brine and dried over MgSO4. The residue was purified through flash chromatography on silica gel (EtOAc:Hexanes=1:1) to give the product (1.80 g) with colorless oil in 82% yield. 1HNMR (CD3OD, ppm) δ 1.03 (m, 2H), 1.51 (m, 1H), 1.61 (m, 6H), 1.73 (m, 2H), 2.63 (t, J=7.4 Hz, 2H), 3.09 (d, J=22.7 Hz, 2H), 3.76 (s, 3H), 3.87 (s, 3H)

Workup

  1. additionwas added dropwise for 10 minutes
  2. stirringThe mixture was stirred for 2 hours at −78° C.
  3. customThe mixture was quenched with addition of 1N HCl to pH 4-5
  4. customThe organic layer was separated
  5. washwashed with brine
  6. dry with materialdried over MgSO4
  7. customThe residue was purified through flash chromatography on silica gel (EtOAc:Hexanes=1:1)

Sources & evidence

ORD record
ord-572ba541342f4b40baa07905019d5d11
Source dataset
uspto-grants-2008_09
DOI
10.6084/m9.figshare.5104873.v1
Patent number
US07419999B2

Reaction notes

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On this pageParticipantsProcedureWorkupSources & evidenceReaction notes