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4-Methylmorpholine → Boc-Ala-Ala-NH-(CH2)4-OH

HRID 1044646
ノート
印刷プレビュー

反応式

HRID 1044646 の反応式
[C:1]([NH:8][C@H:9]([C:11]([NH:13][C@H:14]([C:16]([OH:18])=O)[CH3:15])=[O:12])[CH3:10])([O:3][C:4]([CH3:7])([CH3:6])[CH3:5])=[O:2].CN1CCOCC1.ClC(OCC)=O.[NH2:32][CH2:33][CH2:34][CH2:35][CH2:36][OH:37]>C1COCC1>[NH:8]([C:1]([O:3][C:4]([CH3:5])([CH3:6])[CH3:7])=[O:2])[C@H:9]([C:11]([NH:13][C@H:14]([C:16]([NH:32][CH2:33][CH2:34][CH2:35][CH2:36][OH:37])=[O:18])[CH3:15])=[O:12])[CH3:10]
参加物実験手順後処理出典と根拠反応ノート

参加物

6

反応物 4

HCID 79724-Methylmorpholine2 回HCID 10928Ethyl chloroformateHCID 258684-Amino-1-butanolHCID 6992569N-((1,1-Dimethylethoxy)carbonyl)-L-alanyl-L-alanine

生成物 1

HCID 59537080Boc-Ala-Ala-NH-(CH2)4-OH収率 75%

試薬・触媒・溶媒 1

HCID 8028
Tetrahydrofuran
溶媒
2 回

実験手順

To a vigorously stirring solution of Boc-(Ala)2-OH (0.9 gm, 3.46 mmol) and NMM (0.57 mL, 5.2 mmol) in THF (20 mL) cooled to −15° C. was added under N2 atmosphere ethyl chloroformate (ECF) (372 μL, 3.56 mmol) and stirred for 2 min. A solution of H2N(CH2)4OH (462 mg, 5.19 mmol) in THF (5 mL) was added to the mixture followed by NMM (950 μL, 8.65 mmol) and the mixture was warmed to r.t. and stirred until silica gel TLC indicated complete consumption of the starting acid (eluting solvent—MeOH:DCM—1:10, Rf—0.45) (˜8 h). The solvent was evaporated, and the residue was diluted with EtOAc and washed with brine, water, saturated solutions of citric acid and NaHCO3, and the organic layer was dried using NaHSO4, and the solvent was removed under vacuum to yield a residue which was purified using silica gel flash column chromatography—Hexanes:EtOAc—1:3; to give the desired product in 75% yield (858 mg) as a solid—m.p.—102-104° C.

後処理

  1. stirringstirred until silica gel
  2. customconsumption of the starting acid (eluting solvent—MeOH:DCM—1:10, Rf—0.45) (˜8 h)
  3. customThe solvent was evaporated
  4. additionthe residue was diluted with EtOAc
  5. washwashed with brine, water, saturated solutions of citric acid and NaHCO3
  6. customthe organic layer was dried
  7. customthe solvent was removed under vacuum
  8. customto yield a residue which
  9. customwas purified

出典と根拠

ORDレコード
ord-bd9d8cd11099458aa2f8c3dce2987f7f
出典データセット
uspto-grants-2013_10
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08563686B2

反応ノート

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