ホームMCPワークベンチSkills
ホームワークベンチ通知マイページ
llms.txt · MCPガイドプライバシーポリシー · 利用規約 · サポートv1.8.0
  1. ホーム
  2. /反応

Hexafluoropropylene → 1,2-Oxathietane, 3,4,4-trifluoro-3-(trifluoromethyl)-, 2,2-dioxide

HRID 1182
ノート
印刷プレビュー

反応式

HRID 1182 の反応式
[OH:1][S:2]([OH:5])(=O)=[O:3].O=S(=O)=O.[F:10][C:11]([F:18])([F:17])[C:12]([F:16])=[C:13]([F:15])[F:14]>>[C:12]1([F:16])([C:11]([F:18])([F:17])[F:10])[S:2](=[O:5])(=[O:3])[O:1][C:13]1([F:15])[F:14]
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

3

反応物 2

HCID 8302HexafluoropropyleneHCID 24681Fuming sulfuric acid

生成物 1

HCID 27762401,2-Oxathietane, 3,4,4-trifluoro-3-(trifluoromethyl)-, 2,2-dioxide収率 66%

反応条件

温度
-45 °C

実験手順

A 100 mL Parr™ reactor was charged with 63.8 g of 65% oleum (0.52 mole SO3), cooled to -45° C., evacuated, and then charged with 62 grams (0.44 mole) liquid hexafluoropropene from a cold trap (-78° C.). The reaction mixture was allowed to warm to room temperature. At 20° C. a slight exotherm was observed which increased to a maximum temperature of 56° C. and a pressure of 965 kPa over a 9 minute period. Following the exotherm the reactor was held at 42° C. for 6 hours while the mixture was agitated. The reactor was then vented of excess HFP (with the recovery of 0.7 g HFP) and the contents of the reactor were decanted to yield 103.8 grams (g) of a two phase reaction product. The upper layer (90.6 g) was separated from the lower layer, washed with concentrated sulfuric acid to remove residual SO3 and then distilled to give 63.3 grams of HFP suitone (66% yield with respect to the consumed olefln) with boiling point (b.p.) 45°-50° C. NMR analysis of a higher boiling fraction (b.p. 50°-167° C., yield 25 g) revealed a mixture oftetrafluoropropionic acid derivatives and fluorosulfonic acid. A small portion of this fraction was refluxed in methanol for one hour to give tetrafluoropropionic acid methyl ester (yield 12% based on hexafluoropropene consumed). HFP sultone, after heating with concentrated sulfuric acid for 17 hours at 40° C., was recovered by distillation with 95% yield.

後処理

  1. customevacuated
  2. temperatureto warm to room temperature
  3. customAt 20° C.
  4. temperatureincreased to a maximum temperature of 56° C.
  5. waitwas held at 42° C. for 6 hours while the mixture
  6. customwere decanted
  7. customto yield
  8. customThe upper layer (90.6 g) was separated from the lower layer
  9. washwashed with concentrated sulfuric acid
  10. customto remove residual SO3
  11. distillationdistilled

出典と根拠

ORDレコード
ord-605c87dbb48f48b79511bcb4086ebb7c
出典データセット
uspto-grants-1998_03
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US05723630

反応ノート

読み込み中…

このページの内容参加物反応条件実験手順後処理出典と根拠反応ノート