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Hydrochloric Acid → tert-Butyl 2-(2-ethoxy-2-oxoethyl)benzo[d]thiazole-6-carboxylate

HRID 1190849
ノート
印刷プレビュー

反応式

HRID 1190849 の反応式
C[Si]([N-][Si](C)(C)C)(C)C.[Na+].[C:11]([O:14][CH2:15][CH3:16])(=[O:13])[CH3:12].Cl[C:18]1[S:19][C:20]2[CH:26]=[C:25]([C:27]([O:29][C:30]([CH3:33])([CH3:32])[CH3:31])=[O:28])[CH:24]=[CH:23][C:21]=2[N:22]=1.Cl>C1COCC1.C1(C)C=CC=CC=1>[CH2:15]([O:14][C:11](=[O:13])[CH2:12][C:18]1[S:19][C:20]2[CH:26]=[C:25]([C:27]([O:29][C:30]([CH3:33])([CH3:32])[CH3:31])=[O:28])[CH:24]=[CH:23][C:21]=2[N:22]=1)[CH3:16]
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

7

反応物 4

HCID 313Hydrochloric AcidHCID 8857Ethyl AcetateHCID 2724254Sodium bis(trimethylsilyl)amideHCID 86707743tert-Butyl 2-chlorobenzo[d]thiazole-6-carboxylate

生成物 1

HCID 86707744tert-Butyl 2-(2-ethoxy-2-oxoethyl)benzo[d]thiazole-6-carboxylate収率 67.9%

試薬・触媒・溶媒 2

HCID 1140
Toluene
溶媒
2 回
HCID 8028Tetrahydrofuran溶媒

反応条件

温度
-78 °C

実験手順

To a solution of sodium bis(trimethylsilyl)amide (4.9 mL of a 1M solution in THF, 4.90 mmol) in toluene (10 mL) at −78° C. was added dropwise ethyl acetate (0.26 mL, 2.7 mmol) and the mixture stirred for 1 h then a solution of Compound 188a (0.60 g, 2.2 mmol) in toluene (5 mL) was added over a 7 minute period. The resulting mixture was maintained at −78° C. for 1 h then slowly warmed to 0° C. over a period of 1.5 h. The reaction mixture was poured into a 1 N HCl solution and extracted with EtOAc. The combined extracts were washed with brine, dried over sodium sulfate, filtered and concentrated under reduced pressure. The residue was purified by silica gel chromatography eluting with 0-50% EtOAc/hexanes to give Compound 188b (480 mg, 67% yield) as a white solid. LCMS=2.13 min using analytical method (B), 322.0 (M+H). 1H NMR (400 MHz, CDCl3) δ 8.57-8.52 (m, 1H), 8.11 (dd, J=8.6, 1.5 Hz, 1H), 8.04-7.98 (m, 1H), 4.32-4.25 (m, 2H), 4.20 (s, 2H), 1.63 (s, 9H), 1.32 (t, J=7.2 Hz, 3H).

後処理

  1. temperaturethen slowly warmed to 0° C. over a period of 1.5 h
  2. extractionextracted with EtOAc
  3. washThe combined extracts were washed with brine
  4. dry with materialdried over sodium sulfate
  5. filtrationfiltered
  6. concentrationconcentrated under reduced pressure
  7. customThe residue was purified by silica gel chromatography
  8. washeluting with 0-50% EtOAc/hexanes

出典と根拠

ORDレコード
ord-5c5a88a8bee74bbaaf39c63b4938d9ce
出典データセット
uspto-grants-2014_03
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08680090B2

反応ノート

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