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Chlorotrimethylsilane → Trimethyl[(thiophen-2-yl)methyl]silane

HRID 1721464
ノート
印刷プレビュー

反応式

HRID 1721464 の反応式
[Li]CCCC.[C:6]1([S:12][CH3:13])[CH:11]=[CH:10]C=C[CH:7]=1.Cl[Si:15]([CH3:18])([CH3:17])[CH3:16]>C1COCC1>[S:12]1[CH:13]=[CH:10][CH:11]=[C:6]1[CH2:7][Si:15]([CH3:18])([CH3:17])[CH3:16]
参加物実験手順後処理出典と根拠反応ノート

参加物

5

反応物 3

HCID 6397ChlorotrimethylsilaneHCID 7520ThioanisoleHCID 178418339Butyllithium

生成物 1

HCID 13547226Trimethyl[(thiophen-2-yl)methyl]silane収率 56.4%

試薬・触媒・溶媒 1

HCID 8028Tetrahydrofuran溶媒

実験手順

To a stirred solution of 143 mL of 1.4 M n-BuLi (0.20 mol) in 55 mL of dry THF, was added dropwise at room temperature under a nitrogen atmosphere 24.8 g (0.20 mol) of thioanisole. Upon completion of the addition, the yellow mixture began to reflux spontaneously. The mixture was stirred at room temperature for 3 hours. Upon addition of 21.84 g (0.20 mol) of chlorotrimethylsilane, the mixture again began to reflux spontaneously. After stirring at room temperature overnight, the mixture was quenched with 100 mL of 5% of HC1. The aqueous layer was separated, and the organic layer was dried over MgSO4, filtered, and the solvent removed in vacuo from a water bath at 45° C. The crude product was distilled to give 19.22 g (49%) of the colorless sulfide, bp 84-°86° C./0.3 Torr; 1H NMR (CDCL3) δ 0.17 (s, 9H, Si(CH3)3), 2.13 (s, 2H, CH2S), 7.0-7.42 (m, 5H, phenyl).

後処理

  1. additionUpon completion of the addition
  2. temperatureto reflux spontaneously
  3. temperatureto reflux spontaneously
  4. stirringAfter stirring at room temperature overnight
  5. customthe mixture was quenched with 100 mL of 5% of HC1
  6. customThe aqueous layer was separated
  7. dry with materialthe organic layer was dried over MgSO4
  8. filtrationfiltered
  9. customthe solvent removed in vacuo from a water bath at 45° C
  10. distillationThe crude product was distilled

出典と根拠

ORDレコード
ord-5474b8086f6142ec9e42413766d25dff
出典データセット
uspto-grants-1996_04
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US05510491

反応ノート

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