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Chlorotrimethylsilane → (4-Chloro-2,6-difluorophenyl)trimethylsilane

HRID 1772867
ノート
印刷プレビュー

反応式

HRID 1772867 の反応式
[Li]CCCC.[Cl:6][C:7]1[CH:12]=[C:11]([F:13])[CH:10]=[C:9]([F:14])[CH:8]=1.Cl[Si:16]([CH3:19])([CH3:18])[CH3:17]>C1COCC1>[Cl:6][C:7]1[CH:12]=[C:11]([F:13])[C:10]([Si:16]([CH3:19])([CH3:18])[CH3:17])=[C:9]([F:14])[CH:8]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

5

反応物 3

HCID 6397ChlorotrimethylsilaneHCID 137000Benzene, 1-chloro-3,5-difluoro-HCID 178418339Butyllithium

生成物 1

HCID 18935733(4-Chloro-2,6-difluorophenyl)trimethylsilane

試薬・触媒・溶媒 1

HCID 8028Tetrahydrofuran溶媒2 回

反応条件

温度
-70 °C

実験手順

A solution of 2.5M n-BuLi in hexanes (60 ml, 0.15 mol) was added dropwise to a solution of 1-chloro-3,5-difluorobenzene (19.2 g, 0.13 mol) in THF (200 mL) cooled to −70° C. under Ar. After the addition was complete, the mixture was stirred for 1 h before a solution of chlorotrimethylsilane (21.7 g, 0.2 mol) in THF (25 mL) was added dropwise. The reaction was allowed to warm to rt with stirring overnight before cooling and quenching with H2O. The phases were separated and pentane (200 mL) was added; after washing with H2O the solution was dried over MgSO4 and carefully concentrated in vacuo to yield the title compound as a solution in THF (46 g) which was in the next step without further purification.

後処理

  1. additionAfter the addition
  2. additionwas added dropwise
  3. temperatureto warm to rt
  4. temperaturebefore cooling
  5. customquenching with H2O
  6. customThe phases were separated
  7. additionpentane (200 mL) was added
  8. washafter washing with H2O the solution
  9. dry with materialwas dried over MgSO4
  10. concentrationcarefully concentrated in vacuo

出典と根拠

ORDレコード
ord-6d3fd43fc00d4eeca191889ae9abdcfd
出典データセット
uspto-grants-2016_02
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US09249160B2

反応ノート

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