Dimethylformamide → N-(1-isobutoxyethoxy) 2-(6-{(naphthalene-2-sulfonyl)-[2-(2-oxopyrrolidin-1-yl)ethyl]amino}-3-azabicyclo[3.1.0]hex-3-yl)pyrimidine-5-carboxamide

HRID 2079791

反応式

HRID 2079791 の反応式
[CH:1]1[C:10]2[C:5](=[CH:6][CH:7]=[CH:8][CH:9]=2)[CH:4]=[CH:3][C:2]=1[S:11]([N:14]([CH2:30][CH2:31][N:32]1[CH2:36][CH2:35][CH2:34][C:33]1=[O:37])[CH:15]1[CH:20]2[CH:16]1[CH2:17][N:18]([C:21]1[N:26]=[CH:25][C:24]([C:27](O)=[O:28])=[CH:23][N:22]=1)[CH2:19]2)(=[O:13])=[O:12].C1C=CC2[N:46]([OH:47])N=NC=2C=1.CCN=C=N[CH2:53][CH2:54][CH2:55]N(C)C.Cl.CCN([CH:66]([CH3:68])C)C(C)C.CN([CH:72]=[O:73])C>>[CH2:72]([O:73][CH:66]([O:47][NH:46][C:27]([C:24]1[CH:25]=[N:26][C:21]([N:18]2[CH2:19][CH:20]3[CH:16]([CH:15]3[N:14]([S:11]([C:2]3[CH:3]=[CH:4][C:5]4[C:10](=[CH:9][CH:8]=[CH:7][CH:6]=4)[CH:1]=3)(=[O:13])=[O:12])[CH2:30][CH2:31][N:32]3[CH2:36][CH2:35][CH2:34][C:33]3=[O:37])[CH2:17]2)=[N:22][CH:23]=1)=[O:28])[CH3:68])[CH:54]([CH3:53])[CH3:55]

参加物

6

反応物 5

HCID 6228DimethylformamideHCID 757711-HydroxybenzotriazoleHCID 81531DiisopropylethylamineHCID 27239391,3-Propanediamine, N'-(ethylcarbonimidoyl)-N,N-dimethyl-, monohydrochlorideHCID 593676352-(6-{(Naphthalene-2-sulfonyl)-[2-(2-oxopyrrolidin-1-yl)ethyl]amino}-3-azabicyclo[3.1.0]hex-3-yl)pyrimidine-5-carboxylic acid

生成物 1

HCID 59367679N-(1-isobutoxyethoxy) 2-(6-{(naphthalene-2-sulfonyl)-[2-(2-oxopyrrolidin-1-yl)ethyl]amino}-3-azabicyclo[3.1.0]hex-3-yl)pyrimidine-5-carboxamide収率 43%

実験手順

To a solution of 2-(6-{(naphthalene-2-sulfonyl)-[2-(2-oxopyrrolidin-1-yl)ethyl]amino}-3-azabicyclo[3.1.0]hex-3-yl)pyrimidine-5-carboxylic acid (0.170 g, 0.3 mmol) in DMF (2.5 ml) was added HOBt (83 mg, 0.54 mmol) and EDCl (133 mg, 0.7 mmol). Intermediate D (0.4 ml, 3 mmol) and DIPEA (0.4 ml, 2.5 mmol) were then added and the mixture stirred overnight. The DMF was then evaporated, and the crude mixture loaded directly onto a silica gel column. The product was eluted with 2% MeOH/DCM to 4% MeOH/DCM, to give the title compound as an off-white solid (83 mg, 43%). This was used directly in the next step without characterisation.

後処理

  1. customThe DMF was then evaporated
  2. washThe product was eluted with 2% MeOH/DCM to 4% MeOH/DCM

出典と根拠

ORDレコード
ord-2c948e279ed74e3b840b405f24c7527a
出典データセット
uspto-grants-2011_04
特許番号
US07932246B2

関連ノート

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