Hydrochloric Acid → Chloromethyldimethyl-2-phenylethylsilane

HRID 260636ノート

反応式

HRID 260636 の反応式
[C:1]1([CH2:7][CH2:8][Mg]Br)[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.C1(CCBr)C=CC=CC=1.[Mg].Cl[Si:22]([CH2:25][Cl:26])([CH3:24])[CH3:23].Cl>O1CCCC1.O>[Cl:26][CH2:25][Si:22]([CH3:24])([CH3:23])[CH2:8][CH2:7][C:1]1[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1

参加物

8

反応物 5

HCID 313Hydrochloric AcidHCID 7666Phenethyl bromideHCID 74393Silane, chloro(chloromethyl)dimethyl-HCID 5462224MagnesiumHCID 178419670HCID 178419670、化合物

生成物 1

HCID 22399658Chloromethyldimethyl-2-phenylethylsilane収率 48.5%

試薬・触媒・溶媒 2

HCID 962Water溶媒HCID 8028Tetrahydrofuran溶媒2 回

実験手順

To a solution of 2-phenylethylmagnesium bromide, prepared from 2-phenylethyl bromide (9.25 g, 50 mmol) and magnesium (1.34 g, 55 mmol) in tetrahydrofuran (50 ml), is added chlorochlormethyldimethylsilane (6.43 g, 45 mmol) in tetrahydrofuran (25 ml). The mixture is refluxed for 18 hours, cooled to 0° C. and hydrolyzed with 3N HCl (50 ml). The mixture is then poured in water (50 ml) and diethyl ether (50 ml), the organic layer is washed with water, brine, dried over MgSO4 and the solvents removed in vacuo. Fractional distillation affords the title compound (5.15 g, 48.5% yield).

後処理

  1. temperatureThe mixture is refluxed for 18 hours
  2. washdiethyl ether (50 ml), the organic layer is washed with water, brine
  3. dry with materialdried over MgSO4
  4. customthe solvents removed in vacuo
  5. distillationFractional distillation

出典と根拠

ORDレコード
ord-6a12f37e08094ca1adf45eec0b590c59
出典データセット
uspto-grants-1996_06
特許番号
US05529988

反応ノート

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