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1-Hydroxybenzotriazole → (2S)-N1-((1S,2R)-1-benzyl-3-(cyclopentyloxy)[(4-methoxyphenyl)sulfonyl]amino-2-hydroxypropyl)-2-[(2-quinolinylcarbonyl)amino]butanediamide

HRID 29175
ノート
印刷プレビュー

反応式

HRID 29175 の反応式
[NH2:1][C@@H:2]([CH2:24][C:25]1[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=1)[C@H:3]([OH:23])[CH2:4][N:5](OC1CCCC1)[S:6]([C:9]1[CH:14]=[CH:13][C:12]([O:15][CH3:16])=[CH:11][CH:10]=1)(=[O:8])=[O:7].Cl.CN(C)[CH2:34][CH2:35][CH2:36]N=C=NCC.[OH:43]N1C2C=CC=CC=2N=N1.Cl.[NH2:54][C:55](=[O:74])[CH2:56][C@H:57]([NH:61][C:62]([C:64]1[CH:73]=[CH:72][C:71]2[C:66](=[CH:67][CH:68]=[CH:69][CH:70]=2)[N:65]=1)=[O:63])[C:58]([OH:60])=O.C(N([CH2:82][CH3:83])C(C)C)(C)C>CN(C)C=O>[CH2:24]([C@H:2]([NH:1][C:58](=[O:60])[C@@H:57]([NH:61][C:62]([C:64]1[CH:73]=[CH:72][C:71]2[C:66](=[CH:67][CH:68]=[CH:69][CH:70]=2)[N:65]=1)=[O:63])[CH2:56][C:55]([NH2:54])=[O:74])[C@@H:3]([OH:23])[CH:4]([NH:5][S:6]([C:9]1[CH:14]=[CH:13][C:12]([O:15][CH3:16])=[CH:11][CH:10]=1)(=[O:7])=[O:8])[O:43][CH:34]1[CH2:35][CH2:36][CH2:83][CH2:82]1)[C:25]1[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=1
参加物実験手順後処理出典と根拠反応ノート

参加物

7

反応物 5

HCID 757711-HydroxybenzotriazoleHCID 81531DiisopropylethylamineHCID 27239391,3-Propanediamine, N'-(ethylcarbonimidoyl)-N,N-dimethyl-, monohydrochlorideHCID 57010648N1-[(2R,3S)-3-amino-2-hydroxy-4-phenylbutyl)-N1-(cyclopentyloxy)-4-methoxy-1-benzenesulfonamideHCID 69220928(2S)-4-amino-4-oxo-2-((2-quinolinylcarbonyl)amino]butanoic acid hydrochloride

生成物 1

HCID 86585033
(2S)-N1-((1S,2R)-1-benzyl-3-(cyclopentyloxy)[(4-methoxyphenyl)sulfonyl]amino-2-hydroxypropyl)-2-[(2-quinolinylcarbonyl)amino]butanediamide
収率 41.4%

試薬・触媒・溶媒 1

HCID 6228Dimethylformamide溶媒

実験手順

A mixture of N1-[(2R,3S)-3-amino-2-hydroxy-4-phenylbutyl)-N1-(cyclopentyloxy)-4-methoxy-1-benzenesulfonamide (Step 1, Example 48), (73 mg, 0.168), 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride (34 mg, 0.18 mmol), N-hydroxybenzotriazole (24 mg, 0.18 mmol), and (2S)-4-amino-4-oxo-2-[(2-quinolinylcarbonyl)amino]butanoic acid hydrochloride (57 mg, 0.18 mmol, Eur. Pat. Appl. EP 432694) was combined under an Argon atmosphere at ambient temperature in anhydrous dimethylformamide (2 mL). After addition of N,N-diisopropylethylamine (896 μL, 0.513 mmol), the mixture was stirred for 16 hours. The reaction solvent was removed in vacuo and the residue was dissolved in ethyl acetate. The solution was transferred to a separatory funnel and washed twice with 1N sodium hydrogen sulfate. The combined aqueous layers were extracted with ethyl acetate. The combined organic layers were washed with 5% aqueous potassium carbonate and brine, dried over anhydrous magnesium sulfate, filtered and evaporated in vacuo. The residue was purified on a preparative TLC plate (20×20 cm, 1000 μM) eluting with 97:3 chloroform:methanol. The product band was removed, eluted with 3:1 methylene chloride:methanol, filtered, and evaporated in vacuo. The residue was triturated with hexane and diethyl ether. The slurry was evaporated in vacuo to a residue and dried under high vacuum to provide (2S)-N1-((1S,2R)-1-benzyl-3-(cyclopentyloxy)[(4-methoxyphenyl)sulfonyl]amino-2-hydroxypropyl)-2-[(2-quinolinylcarbonyl)amino]butanediamide (49 mg, 41%) as a white solid. H1-NMR (chloroform-D3): 1.52 (m, 4H), 1.75 (m, 4H), 2.82 (m, 5H), 3.10 (m, 1H), 3.82 (b, 1H), 3.84 (s, 3H), 3.91 m, 1H), 4.29 (m, 1H), 4.78 (m, 1H), 4.95 (m, 1H), 5.76 (b, 1H), 6.22 (b, 1H), 7.00 (m, 5H), 7.12 (d, 2H), 7.22 (d, 1H), 7.60 (m, 1H), 7.75 (m, 3H), 7.83 (d, 1H), 8.14 (m, 2H), 8.25 (d, 1H), 9.15 (d, 1H). MS(ESI): 704 (M+H).

後処理

  1. customThe reaction solvent was removed in vacuo
  2. dissolutionthe residue was dissolved in ethyl acetate
  3. customThe solution was transferred to a separatory funnel
  4. washwashed twice with 1N sodium hydrogen sulfate
  5. extractionThe combined aqueous layers were extracted with ethyl acetate
  6. washThe combined organic layers were washed with 5% aqueous potassium carbonate and brine
  7. dry with materialdried over anhydrous magnesium sulfate
  8. filtrationfiltered
  9. customevaporated in vacuo
  10. customThe residue was purified on a preparative TLC plate (20×20 cm, 1000 μM)
  11. washeluting with 97:3 chloroform
  12. customThe product band was removed
  13. washeluted with 3:1 methylene chloride
  14. filtrationmethanol, filtered
  15. customevaporated in vacuo
  16. customThe residue was triturated with hexane and diethyl ether
  17. customThe slurry was evaporated in vacuo to a residue
  18. customdried under high vacuum

出典と根拠

ORDレコード
ord-54829210415e4ca7b0d2720829bb4ebf
出典データセット
uspto-grants-2008_09
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US07419967B2

反応ノート

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