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Sodium hydride → 2-(3,4-Difluorophenyl)-4-(tetrahydro-2-pyranyloxy)butanenitrile

HRID 355466
ノート
印刷プレビュー

反応式

HRID 355466 の反応式
[F:1][C:2]1[CH:3]=[C:4]([CH2:9][C:10]#[N:11])[CH:5]=[CH:6][C:7]=1[F:8].[H-].[Na+].Br[CH2:15][CH2:16][O:17][CH:18]1[CH2:23][CH2:22][CH2:21][CH2:20][O:19]1>C1COCC1>[F:1][C:2]1[CH:3]=[C:4]([CH:9]([CH2:15][CH2:16][O:17][CH:18]2[CH2:23][CH2:22][CH2:21][CH2:20][O:19]2)[C:10]#[N:11])[CH:5]=[CH:6][C:7]=1[F:8]
参加物実験手順後処理出典と根拠反応ノート

参加物

5

反応物 3

HCID 24758Sodium hydrideHCID 69572(3,4-Difluorophenyl)acetonitrileHCID 866212-(2-Bromoethoxy)tetrahydro-2H-pyran

生成物 1

HCID 224526272-(3,4-Difluorophenyl)-4-(tetrahydro-2-pyranyloxy)butanenitrile収率 54.5%

試薬・触媒・溶媒 1

HCID 8028Tetrahydrofuran溶媒3 回

実験手順

A solution of 50 g of 3,4-difluorophenyl acetonitrile in 50 ml of THF is added dropwise at 20° C. to a suspension of 14.4 g of 60% sodium hydride in oil in 250 ml of THF, and the reaction mixture is left stirring for three hours at RT. It is cooled in an ice bath, a solution of 68.2 g of 1-bromo-2-(tetrahydro-2-pyranyloxy)ethane in 50 ml of THF is added dropwise and the reaction mixture is left stirring overnight at RT. It is acidified by adding a pH 2 buffer solution, and the THF is then evaporated off under vacuum. The aqueous phase is extracted with ether, the organic phase is washed twice with a pH 4 buffer solution, with water and with saturated NaCl solution and dried over Na2SO4 and the solvent is evaporated off under vacuum. The residue is chromatographed on silica, eluting with toluene and then with a toluene/AcOEt (100:3; v/v) mixture. 50 g of the expected product are obtained.

後処理

  1. waitthe reaction mixture is left
  2. temperatureIt is cooled in an ice bath
  3. waitthe reaction mixture is left
  4. stirringstirring overnight at RT
  5. customthe THF is then evaporated off under vacuum
  6. extractionThe aqueous phase is extracted with ether
  7. washthe organic phase is washed twice with a pH 4 buffer solution, with water and with saturated NaCl solution
  8. dry with materialdried over Na2SO4
  9. customthe solvent is evaporated off under vacuum
  10. customThe residue is chromatographed on silica
  11. washeluting with toluene

出典と根拠

ORDレコード
ord-cd3cff164cf4481e84e5e5a23a929a18
出典データセット
uspto-grants-1998_11
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US05830906

反応ノート

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