反応式
[Si:1]([O:8][CH2:9][C@@H:10]([N:15]([CH3:28])[C:16]([NH:18][CH2:19][C:20]1[CH:25]=[CH:24][CH:23]=[C:22]([F:26])[C:21]=1[F:27])=[O:17])[CH2:11][CH2:12][CH2:13][OH:14])([C:4]([CH3:7])([CH3:6])[CH3:5])([CH3:3])[CH3:2].[Si]([O:36]C(CC(N(C)C(NCC1C=CC=C(F)C=1F)=O)C)C([O-])=O)(C(C)(C)C)(C)C.N1C=NN=N1.C(N(C(C)C)[P:67]([O:73][C:74]([CH3:77])([CH3:76])[CH3:75])[O:68][C:69]([CH3:72])([CH3:71])[CH3:70])(C)C.C1C=C(Cl)C=C(C(OO)=O)C=1>C1COCC1>[P:67]([O:14][CH2:13][CH2:12][CH2:11][C@H:10]([N:15]([CH3:28])[C:16]([NH:18][CH2:19][C:20]1[CH:25]=[CH:24][CH:23]=[C:22]([F:26])[C:21]=1[F:27])=[O:17])[CH2:9][O:8][Si:1]([C:4]([CH3:5])([CH3:7])[CH3:6])([CH3:2])[CH3:3])([O:68][C:69]([CH3:70])([CH3:71])[CH3:72])([O:73][C:74]([CH3:75])([CH3:76])[CH3:77])=[O:36]参加物
反応物 4
生成物 1
試薬・触媒・溶媒 1
実験手順
To a solution of (S)-1-(1-(tert-butyldimethylsilyloxy)-5-hydroxypentan-2-yl)-3-(2,3-difluorobenzyl)-1-methylurea-(tert-butyldimethylsilyloxy)-4-(3-(2,3-difluorobenzyl)-1-methylureido)pentanoate (6.1 g, 14.66 mmol) in THF (20 mL) was added tetrazole (0.34 M in acetonitrile, 172.0 mL, 58.64 mmol) followed by addition of di-tert-butyl diisopropylphosphoramidite (9.3 mL, 29.32 mmol) at RT The resulting solution was stirred at RT for 2 h. To this mixture was added MCPBA (70%, 7.3 g, 29.32 mmol) at RT. The reaction mixture was stirred at RT overnight and quenched with Na2SO3. The mixture was filtered and the filtrate was concentrated and dissolved in EtOAc. The organic mixture was washed with NaOH (1N×2), NaHCO3 (sat.), and brine, dried over Na2SO4, filtered, and concentrated under reduced pressure. The residue was purified on silica gel column using a mixture of EtOAc and hexanes to give (S)-di-tert-butyl 5-(tert-butyldimethylsilyloxy)-4-(3-(2,3-difluorobenzyl)-1-methylureido)pentyl phosphate (4.1 g, 54%). LRMS (M+H+−2 tBu) m/z 491.2.
後処理
- stirringThe reaction mixture was stirred at RT overnight
- customquenched with Na2SO3
- filtrationThe mixture was filtered
- concentrationthe filtrate was concentrated
- dissolutiondissolved in EtOAc
- washThe organic mixture was washed with NaOH (1N×2), NaHCO3 (sat.), and brine
- dry with materialdried over Na2SO4
- filtrationfiltered
- concentrationconcentrated under reduced pressure
- customThe residue was purified on silica gel column
- additiona mixture of EtOAc and hexanes
出典と根拠
- ORDレコード
- ord-bd99809860e042dfb1ffe8ada8739506
- 出典データセット
- uspto-grants-2012_01
- 特許番号
- US08088793B2
関連ノート
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