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Phenethyl bromide → HCID 178491088、化合物

HRID 45971
ノート
印刷プレビュー

反応式

HRID 45971 の反応式
C([N:20]1[C:24]2[CH:25]=[CH:26][C:27]([NH:29][C:30]3C=C[C:33](OC)=[CH:32][CH:31]=3)=[CH:28][C:23]=2[N:22]=[CH:21]1)(C1C=CC=CC=1)(C1C=CC=CC=1)C1C=CC=CC=1.C[Si]([N-][Si](C)(C)C)(C)C.[Li+].[C:48]1([CH2:54][CH2:55]Br)[CH:53]=[CH:52][CH:51]=[CH:50][CH:49]=1.[CH2:57]1[CH2:61][O:60][CH2:59][CH2:58]1>O>[CH3:59][O:60][C:61]1[CH:57]=[CH:58][C:31]([CH2:30][N:29]([CH2:55][CH2:54][C:48]2[CH:53]=[CH:52][CH:51]=[CH:50][CH:49]=2)[C:27]2[CH:26]=[CH:25][C:24]3[NH:20][CH:21]=[N:22][C:23]=3[CH:28]=2)=[CH:32][CH:33]=1
参加物反応条件実験手順後処理出典と根拠反応ノート

参加物

6

反応物 4

HCID 7666Phenethyl bromideHCID 8028Tetrahydrofuran2 回HCID 2733832Lithium hexamethyldisilazaneHCID 67445320N1-Trityl-N-(4-methoxyphenyl)benzimidazol-5-amine

生成物 1

HCID 178491088HCID 178491088、化合物

試薬・触媒・溶媒 1

HCID 962Water溶媒

反応条件

温度
0 °C

実験手順

N1-Trityl-N-(4-methoxyphenyl)benzimidazol-5-amine (990 mg; 2 mmol; 1 eq.) was dissolved in THF (5 ml), cooled to 0° C. and treated with lithiumbis(trimethylsilyl)amide 1M in THF (2.4 ml; 2.4 mmol; 1.2 eq.). Phenylethylbromide (0.330 ml; 2.4 mmol; 2.4 eq.) was added and the mixture was stirred at room temperature for 24 h. The mixture was diluted with water and extracted with ethyl acetate (3×25 ml). The combined organic layers were dried over Na2SO4 and evaporated. The residue was dissolved in MeOH (5 ml) and treated with TFA (1 ml). After heating to reflux for 1 h the mixture was poured into saturated NaHCO3-solution and extracted with ethyl acetate (3×25 ml). The combined organic layers were dried over Na2SO4 and evaporated. The residue was purified by flash chromatography on silica using a CHCl3/MeOH gradient. Yield: 0.058 g (8.1%); MS m/z: 358.1 [M+H]+; 1H-NMR (500 MHz, DMSO d6): δ 2.85 (t, 2H, 3J=7.9 Hz); 3.57 (t, 2H, 3J=7.9 Hz); 3.69 (s, 3H); 4.44 (s, 2H); 6.77-6.79 (m, 2H); 6.83-6.86 (m, 2H); 7.14-7.16 (m, 2H); 7.18-7.21 (m, 1H); 7.23-7.25 (m, 2H); 7.28-7.30 (m, 2H); 7.38-7.39 (m, 1H); 7.92 (s, 1H); 11.92 (br s, 1H); HPLC (METHOD [A]): rt 16.74 min (96.3%)

後処理

  1. extractionextracted with ethyl acetate (3×25 ml)
  2. dry with materialThe combined organic layers were dried over Na2SO4
  3. customevaporated
  4. dissolutionThe residue was dissolved in MeOH (5 ml)
  5. additiontreated with TFA (1 ml)
  6. temperatureAfter heating
  7. temperatureto reflux for 1 h the mixture
  8. additionwas poured into saturated NaHCO3-solution
  9. extractionextracted with ethyl acetate (3×25 ml)
  10. dry with materialThe combined organic layers were dried over Na2SO4
  11. customevaporated
  12. customThe residue was purified by flash chromatography on silica using a CHCl3/MeOH gradient
  13. customrt 16.74 min (96.3%)

出典と根拠

ORDレコード
ord-3d9fa014f1e84fa8a28a8caf7b5b3ec1
出典データセット
uspto-grants-2013_09
DOI
10.6084/m9.figshare.5104873.v1
特許番号
US08541596B2

反応ノート

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