Hydrochloric Acid → HCID 178487705, 화합물
반응식
[Cl:1][C:2]1[C:3]([O:16][CH3:17])=[CH:4][CH:5]=[C:6]2[C:11]=1[N:10]=[C:9]([C:12](O)=[O:13])[CH:8]=[C:7]2[OH:15].[CH3:18][NH:19][CH3:20].C1COCC1.CN(C(ON1N=NC2C=CC=NC1=2)=[N+](C)C)C.F[P-](F)(F)(F)(F)F.CN1CCOCC1.Cl>CN(C=O)C.CCOC(C)=O>[CH3:18][N:19]([CH3:20])[C:12]([C:9]1[CH:8]=[C:7]([OH:15])[C:6]2[C:11](=[C:2]([Cl:1])[C:3]([O:16][CH3:17])=[CH:4][CH:5]=2)[N:10]=1)=[O:13]참가 물질
9
반응물 6
생성물 1
시약·촉매·용매 2
실험 절차
The 8-chloro-4-hydroxy-7-methoxy-quinoline-2-carboxylic acid (500 mg, 1.97 mmol) and 2.0 M dimethylamine in THF (2 mL, 3.94 mmol) were dissolved in DMF (20 mL). HATU (1.5 g, 3.94 mmol) and NMM (697 mg, 6.89 mmol) were added and the mixture was stirred at r.t. overnight. The reaction was diluted with EtOAc and acidified with 1 N HCl. The two layers were separated. The organic layer was washed with 2% LiCl, saturated NaHCO3 and brine, dried with Na2SO4, and concentrated to give 8-chloro-4-hydroxy-7-methoxy-quinoline-2-carboxylic acid dimethylamide.
후처리
- customThe two layers were separated
- washThe organic layer was washed with 2% LiCl, saturated NaHCO3 and brine
- dry with materialdried with Na2SO4
- concentrationconcentrated
출처 및 근거
- ORD 기록
- ord-ac172748bba94e6293dcf87b1b360fd6
- 출처 데이터셋
- uspto-grants-2014_03
- 특허 번호
- US08674088B2
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