Hydrochloric Acid → Methyl (4R)-1-[(2S)-2-cyclohexyl-2-({[(2,2-dimethylpent-4-en-1-yl)oxy]carbonyl}amino)acetyl]-4-[(7-methoxy-2-oxo-6-vinyl-1,2-dihydroquinolin-4-yl)oxy]-L-prolinate

HRID 1423376노트

반응식

HRID 1423376 반응식
Cl.[CH3:2][O:3][C:4]1[CH:13]=[C:12]2[C:7]([C:8]([O:15][C@H:16]3[CH2:20][NH:19][C@H:18]([C:21]([O:23][CH3:24])=[O:22])[CH2:17]3)=[CH:9][C:10](=[O:14])[NH:11]2)=[CH:6][C:5]=1[CH:25]=[CH2:26].[CH:27]1([C@H:33]([NH:37][C:38]([O:40][CH2:41][C:42]([CH3:47])([CH3:46])[CH2:43][CH:44]=[CH2:45])=[O:39])[C:34](O)=[O:35])[CH2:32][CH2:31][CH2:30][CH2:29][CH2:28]1.CCN(C(C)C)C(C)C.CN(C(ON1N=NC2C=CC=NC1=2)=[N+](C)C)C.F[P-](F)(F)(F)(F)F.Cl>CN(C=O)C.CCOC(C)=O>[CH:27]1([C@H:33]([NH:37][C:38]([O:40][CH2:41][C:42]([CH3:47])([CH3:46])[CH2:43][CH:44]=[CH2:45])=[O:39])[C:34]([N:19]2[CH2:20][C@H:16]([O:15][C:8]3[C:7]4[C:12](=[CH:13][C:4]([O:3][CH3:2])=[C:5]([CH:25]=[CH2:26])[CH:6]=4)[NH:11][C:10](=[O:14])[CH:9]=3)[CH2:17][C@H:18]2[C:21]([O:23][CH3:24])=[O:22])=[O:35])[CH2:28][CH2:29][CH2:30][CH2:31][CH2:32]1

참가 물질

8

실험 절차

To a solution of the product from Step 4, methyl (4R)-4-[(7-methoxy-2-oxo-6-vinyl-1,2-dihydroquinolin-4-yl)oxy]-L-prolinate hydrochloride (0.84 g, 2.206 mmol) and linker B20, (2S)-cyclohexyl({[(2,2-dimethylpent-4-en-1-yl)oxy]carbonyl}amino)acetic acid (0.689 g, 2.316 mmol) in DMF (2 mL) was added DIPEA (1.156 mL, 6.62 mmol) and HATU (1.090 g, 2.87 mmol). After 15 min, the reaction was complete and 1 N HCl and EtOAc were added. The organic layer was washed with water and brine, dried over MgSO4 and the solvent was removed in vacuo. The crude product was purified on silica (gradient elution, 0-5% MeOH/DCM) to yield 1.65 g of material which still contained HATU residue. This was removed by extracting the material with EtOAc and 1N HCl (4×), water (1×) and brine (1×). The organic layer was dried over MgSO4 and the solvent was removed in vacuo to yield 1.13 g (82%) of the title compound. LRMS ESI+(M+H)+ 624.6.

후처리

  1. washThe organic layer was washed with water and brine
  2. dry with materialdried over MgSO4
  3. customthe solvent was removed in vacuo
  4. customThe crude product was purified on silica (gradient elution, 0-5% MeOH/DCM)

출처 및 근거

ORD 기록
ord-1eb36b68168a48e79eb4e63ebbc43a5e
출처 데이터셋
uspto-grants-2015_01
특허 번호
US08927569B2

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