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Diisopropylethylamine → [(4-Cyclopropylmethoxy-benzenesulfonyl)-(4-dimethylamino-benzyl)-amino]-acetic acid methyl ester

HRID 1442672
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반응식

HRID 1442672 반응식
[CH3:1][O:2][C:3](=[O:16])[CH2:4][NH:5][CH2:6][C:7]1[CH:12]=[CH:11][C:10]([N:13]([CH3:15])[CH3:14])=[CH:9][CH:8]=1.C(N(C(C)C)CC)(C)C.[CH:26]1([CH2:29][O:30][C:31]2[CH:36]=[CH:35][C:34]([S:37](Cl)(=[O:39])=[O:38])=[CH:33][CH:32]=2)[CH2:28][CH2:27]1>CN(C1C=CN=CC=1)C.C(Cl)Cl>[CH3:1][O:2][C:3](=[O:16])[CH2:4][N:5]([S:37]([C:34]1[CH:33]=[CH:32][C:31]([O:30][CH2:29][CH:26]2[CH2:27][CH2:28]2)=[CH:36][CH:35]=1)(=[O:39])=[O:38])[CH2:6][C:7]1[CH:8]=[CH:9][C:10]([N:13]([CH3:15])[CH3:14])=[CH:11][CH:12]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 3

HCID 81531DiisopropylethylamineHCID 113686084-(cyclopropylmethoxy)benzenesulfonyl ChlorideHCID 11401797(4-Dimethylamino-benzylamino)-acetic acid methyl ester

생성물 1

HCID 11224248[(4-Cyclopropylmethoxy-benzenesulfonyl)-(4-dimethylamino-benzyl)-amino]-acetic acid methyl ester

시약·촉매·용매 2

HCID 142844-(Dimethylamino)pyridine촉매
HCID 6344Dichloromethane용매2회

실험 절차

To a solution of 49.4 g (222 mmol) of [(4-dimethylamino-benzylamino)-acetic acid methyl ester], 41.4 ml (244 mmol) of diisopropylethyl amine and 0.271 g (2.2 mmol) of DMAP in 600 ml of CH2Cl2, 54.8 g (222 mmol) of 4-cyclopropylmethoxy-benzenesulfonyl chloride in 100 ml of CH2Cl2 are added at 0-5° C. After stirring for 15 h at r.t., the reaction mixture is quenched with Ice water and sat. aqueous NH4CO3. The mixture is extracted with AcOEt and combined extracts are washed with sat. aqueous NH4CO3 and brine, dried over MgSO4 and concentrated under reduced pressure. The residue is purified by CC on silicage gel (n-Hexane:AcOEt=4:1) to give the title compound as a colorless solid.

후처리

  1. customthe reaction mixture is quenched with Ice water and sat. aqueous NH4CO3
  2. extractionThe mixture is extracted with AcOEt and combined extracts
  3. washare washed with sat. aqueous NH4CO3 and brine
  4. dry with materialdried over MgSO4
  5. concentrationconcentrated under reduced pressure
  6. customThe residue is purified by CC on silicage gel (n-Hexane:AcOEt=4:1)

출처 및 근거

ORD 기록
ord-c744dc3f3b0a401da0110349c33119cf
출처 데이터셋
uspto-grants-2010_02
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07659293B2

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