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Phenylacetyl chloride → HCID 66865174, 화합물

HRID 1629967
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HRID 1629967 반응식
[CH3:1][O:2][C:3]1[CH:4]=[C:5]([C:11]2[CH2:15][CH2:14][NH:13][N:12]=2)[CH:6]=[CH:7][C:8]=1[O:9][CH3:10].CCN(C(C)C)C(C)C.[C:25]1([CH2:31][C:32](Cl)=[O:33])[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=1>C(Cl)Cl>[CH3:1][O:2][C:3]1[CH:4]=[C:5]([C:11]2[CH2:15][CH2:14][N:13]([C:32](=[O:33])[CH2:31][C:25]3[CH:30]=[CH:29][CH:28]=[CH:27][CH:26]=3)[N:12]=2)[CH:6]=[CH:7][C:8]=1[O:9][CH3:10]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

5

반응물 3

HCID 7679Phenylacetyl chlorideHCID 81531DiisopropylethylamineHCID 21332725HCID 21332725, 화합물

생성물 1

HCID 66865174HCID 66865174, 화합물수율 19%

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

A scintillation vial equipped with a stir bar was charged with 3-(3,4-dimethoxy-phenyl)-4,5-dihydro-1H-pyrazole (412 mg, 2 mmol), Hunigs base (1 mL, 6 mmol) and dry CH2Cl2 (10 mL). To this mixture was added phenyl-acetyl chloride, (0.27 mL, 2 mmol) and the reaction was stirred at RT for 3 h. LC-MS indicated consumption of SM. The mixture was diluted with CH2Cl2 (50 mL) and added to water (50 mL). The phases were separated and the CH2Cl2 phase was washed with saturated Na2CO3, (50 mL), dried (Na2SO4) and the solvent was evaporated under reduced pressure. The material was purified using a 40 g silica cartridge eluting with heptane-EtOAc, gradient 0 to 100% EtOAc. Amount obtained: 123 mg, 0.37 mmol, 19% yield. LC-MS (ESI) m/e 325 (M+H). 1H NMR (400 MHz, CHLOROFORM-d) δ ppm 3.21 (t, J=10.03 Hz, 2H) 3.94 (s, 3H) 3.98 (s, 3H) 4.04 (t, J=10.03 Hz, 2H) 4.11 (s, 2H) 6.90 (d, J=8.35 Hz, 1H) 7.16 (dd, J=8.27, 1.88 Hz, 1H) 7.21-7.26 (m, 1H) 7.31 (t, J=7.42 Hz, 2H) 7.40-7.44 (m, 3H).

후처리

  1. customA scintillation vial equipped with a stir bar
  2. customconsumption of SM
  3. additionThe mixture was diluted with CH2Cl2 (50 mL)
  4. additionadded to water (50 mL)
  5. customThe phases were separated
  6. washthe CH2Cl2 phase was washed with saturated Na2CO3, (50 mL)
  7. dry with materialdried (Na2SO4)
  8. customthe solvent was evaporated under reduced pressure
  9. customThe material was purified
  10. washeluting with heptane-EtOAc, gradient 0 to 100% EtOAc
  11. customAmount obtained

출처 및 근거

ORD 기록
ord-453b6b7b40514a54977ae39224942bb8
출처 데이터셋
uspto-grants-2014_07
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08791114B2

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