Hydrochloric Acid → HCID 24694245, 화합물

HRID 1672402노트

반응식

HRID 1672402 반응식
C[O:2][C:3](=[O:13])[CH2:4][S:5][C:6]1[CH:11]=[CH:10][C:9]([Cl:12])=[CH:8][N:7]=1.O[Li].O.Cl>C1COCC1.O>[Cl:12][C:9]1[CH:10]=[CH:11][C:6]([S:5][CH2:4][C:3]([OH:13])=[O:2])=[N:7][CH:8]=1

참가 물질

6

반응물 3

HCID 313Hydrochloric AcidHCID 168937Lithium hydroxide, monohydrateHCID 60735499HCID 60735499, 화합물

생성물 1

HCID 24694245HCID 24694245, 화합물수율 98.2%

시약·촉매·용매 2

HCID 962Water용매HCID 8028Tetrahydrofuran용매

실험 절차

To the solution of the ester 14 (0.43 g, 2.0 mmol) in THF (18 mL) was added LiOH.H2O (0.17 g, 4 mmol) as a solution in 5 mL of H2O. The reaction mixture was stirred at room temperature and monitored by TLC. When no staring material was observed, the reaction mixture was acidified with 1N HCl, (˜4.5 mL) and concentrated under reduce pressure to remove the organic solvent. The mixture was diluted with 15 mL of H2O and extracted with EtOAc (2×120 mL). The organic layer was washed with brine, dried over Na2SO4, concentrated and dried under high vacuum over P2O5 to give 0.40 g (98% yield) of compound 15 which was used in subsequent reaction without further purification.

후처리

  1. concentrationconcentrated
  2. customto remove the organic solvent
  3. additionThe mixture was diluted with 15 mL of H2O
  4. extractionextracted with EtOAc (2×120 mL)
  5. washThe organic layer was washed with brine
  6. dry with materialdried over Na2SO4
  7. concentrationconcentrated
  8. dry with materialdried under high vacuum over P2O5

출처 및 근거

ORD 기록
ord-83f7ed07a2d34ad4a55780fec6d6b5cd
출처 데이터셋
uspto-grants-2011_08
특허 번호
US07998980B2

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