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Hydrochloric Acid → HCID 11515492, 화합물

HRID 1682341
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HRID 1682341 반응식
[C:1]1([S:7]([CH:10]([F:12])[F:11])(=[O:9])=[O:8])[CH:6]=[CH:5][CH:4]=[CH:3][CH:2]=1.[Cl:13][C:14]1[CH:21]=[CH:20][C:17]([CH:18]=[O:19])=[CH:16][CH:15]=1.[OH-].[Na+].Cl>CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)C.[Cl-].ClCCl>[Cl:13][C:14]1[CH:21]=[CH:20][C:17]([CH:18]([OH:19])[C:10]([F:12])([F:11])[S:7]([C:1]2[CH:2]=[CH:3][CH:4]=[CH:5][CH:6]=2)(=[O:9])=[O:8])=[CH:16][CH:15]=1
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참가 물질

7

반응물 4

HCID 313Hydrochloric AcidHCID 77264-ChlorobenzaldehydeHCID 14798Sodium HydroxideHCID 11816356((Difluoromethyl)sulfonyl)benzene

생성물 1

HCID 11515492HCID 11515492, 화합물수율 88.4%

시약·촉매·용매 2

HCID 21218Trioctylmethylammonium chloride
촉매
HCID 6344Dichloromethane용매

실험 절차

A reaction mixture generated from 100 mg (0.52 mmol) of difluoromethyl phenyl sulfone, 225 mg (1.6 mmol) of 4-chlorobenzaldehyde, 1.5 mL of dichloromethane, 1 mL of 50% aqueous sodium hydroxide and 20 mg (0.050 mmol) of Aliquat 336 was poured into 20 mL of 1N HCl. Extraction of the aqueous mixture with three 10 mL portions of ethyl acetate followed by combination, drying (MgSO4), and concentration in vacuo of the organic layers gave a residue which was purified by preparative TLC (two 2 mm silica gel plates eluted with 10% ethyl acetate in toluene), affording 153 mg (88% yield) of 1-(4-chlorophenyl)-2,2-difluoro-2-phenylsulfonylethanol as a solid. Crystallization from toluene provided an analytical sample: mp; 100°-102° C.; IR (KBr) 3530, 3060, 2921, 1491, 1446, 1332, 1157, 1120, 1113, 1090, 1016, 1005, 784, 723, 683, 589, 538 cm-1 ; 1H NMR (CDCl3) δ 3.62 (broad s, 1H), 5.56 (dd, 1H, J=20, 3 Hz), 7.26-8.13 (m, 9H); 19F NMR (CDCl3, relative to CFCl3 -104.8 ppm (dd, 1F, JFF =238 Hz, JHF =3 Hz), -119.2 ppm (dd, 1F, JFF =238 Hz, JHF =20 Hz); mass spectrum (70 eV) m/e (relative intensity) 332 (9, M+), 143(44), 141(100, 77(33). Anal. Calcd. for C14H11ClF2O3S: C, 50.53; H, 3.33. Found: C, 50.49; H, 3.41.

후처리

  1. extractionExtraction of the aqueous mixture with three 10 mL portions of ethyl acetate
  2. customdrying
  3. concentration(MgSO4), and concentration in vacuo of the organic layers
  4. customgave a residue which
  5. customwas purified by preparative TLC (two 2 mm silica gel plates eluted with 10% ethyl acetate in toluene)

출처 및 근거

ORD 기록
ord-862f11298db444c0bfe0436d72747a14
출처 데이터셋
uspto-grants-1992_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05175302

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