Styrene → n-Hexylphenethyldichlorosilane

HRID 1733421

반응식

HRID 1733421 반응식
[CH2:1]([SiH:7]([Cl:9])[Cl:8])[CH2:2][CH2:3][CH2:4][CH2:5][CH3:6].[CH2:10]=[CH:11][C:12]1[CH:17]=[CH:16][CH:15]=[CH:14][CH:13]=1>C1C=CC([P]([Pt]([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)([P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)[P](C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)(C2C=CC=CC=2)C2C=CC=CC=2)=CC=1>[CH2:1]([Si:7]([CH2:10][CH2:11][C:12]1[CH:17]=[CH:16][CH:15]=[CH:14][CH:13]=1)([Cl:9])[Cl:8])[CH2:2][CH2:3][CH2:4][CH2:5][CH3:6]

참가 물질

4

반응물 2

HCID 7501StyreneHCID 92038703Dichloro(hexyl)silane

생성물 1

HCID 20299100n-Hexylphenethyldichlorosilane수율 91.1%

시약·촉매·용매 1

HCID 178420539HCID 178420539, 화합물촉매

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온도
60 °C

실험 절차

3.80 g (20.5 millimol) of n-hexyldichlorosilane, 2.00 g (19.2 millimol) of styrene, and 0.023 g (1.92×10-5 mol) of tetrakis(triphenylphosphine)platinum (O) were introduced into a flask and reacted with stirring by heating in an oil bath at 60° C. for 8 hours and then subjected to distillation under a reduced pressure to produce 5.6 g (17.5 millimol) of n-hexylphenethyldichlorosilane.

후처리

  1. customreacted
  2. distillationsubjected to distillation under a reduced pressure

출처 및 근거

ORD 기록
ord-4683dd3e1a49444ebbe1ea160db91666
출처 데이터셋
uspto-grants-1980_12
특허 번호
US04242272

연결된 노트

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