Hydrochloric Acid → HCID 178487705, 화합물

HRID 2044019노트

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HRID 2044019 반응식
[Cl:1][C:2]1[C:3]([O:16][CH3:17])=[CH:4][CH:5]=[C:6]2[C:11]=1[N:10]=[C:9]([C:12](O)=[O:13])[CH:8]=[C:7]2[OH:15].[CH3:18][NH:19][CH3:20].C1COCC1.CN(C(ON1N=NC2C=CC=NC1=2)=[N+](C)C)C.F[P-](F)(F)(F)(F)F.CN1CCOCC1.Cl>CN(C=O)C.CCOC(C)=O>[CH3:18][N:19]([CH3:20])[C:12]([C:9]1[CH:8]=[C:7]([OH:15])[C:6]2[C:11](=[C:2]([Cl:1])[C:3]([O:16][CH3:17])=[CH:4][CH:5]=2)[N:10]=1)=[O:13]

참가 물질

9

실험 절차

The 8-chloro-4-hydroxy-7-methoxy-quinoline-2-carboxylic acid (500 mg, 1.97 mmol) and 2.0 M dimethylamine in THF (2 mL, 3.94 mmol) were dissolved in DMF (20 mL). HATU (1.5 g, 3.94 mmol) and NMM (697 mg, 6.89 mmol) were added and the mixture was stirred at r.t. overnight. The reaction was diluted with EtOAc and acidified with 1 N HCl. The two layers were separated. The organic layer was washed with 2% LiCl, saturated NaHCO3 and brine, dried with Na2SO4, and concentrated to give 8-chloro-4-hydroxy-7-methoxy-quinoline-2-carboxylic acid dimethylamide.

후처리

  1. customThe two layers were separated
  2. washThe organic layer was washed with 2% LiCl, saturated NaHCO3 and brine
  3. dry with materialdried with Na2SO4
  4. concentrationconcentrated

출처 및 근거

ORD 기록
ord-4190f1b95fe543f9a15b5d04570afd55
출처 데이터셋
uspto-grants-2013_11
특허 번호
US08586744B2

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