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Mesitylene → Bis(eta-cyclopentadienyl) iron

HRID 217547
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인쇄 미리보기

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HRID 217547 반응식
[C:1]1([CH3:9])[CH:6]=[C:5]([CH3:7])C=C(C)C=1.C([C-:12]1[CH:16]=[CH:15][CH:14]=[CH:13]1)=C.[CH-]1C=CC=C1.[Fe+2:22].[C-]1(C=O)C=CC=C1.[CH-]1C=CC=C1.[Fe+2]>>[CH-:5]1[CH:6]=[CH:1][CH:9]=[CH:7]1.[CH-:12]1[CH:16]=[CH:15][CH:14]=[CH:13]1.[Fe+2:22]
참가 물질반응 조건실험 절차후처리출처 및 근거반응 노트

참가 물질

4

반응물 3

HCID 7947MesityleneHCID 15184314Ferrocenecarboxyaldehyde2회HCID 15807218Cyclopenta-1,3-diene;5-ethenylcyclopenta-1,3-diene;iron(2+)2회

생성물 1

HCID 7611Bis(eta-cyclopentadienyl) iron

반응 조건

온도
150 °C

실험 절차

Approximately 10 mmol mesitylene solution of vinylferrocene (VFc) or ferrocenecarboxaldehyde (FcA) was put in a round bottom flask and bubbled with nitrogen or argon gas for at least 30 min. A piece of the H-terminated silicon substrate was then immersed in the solution and allowed to react with VFc or FcA for about 12 h under reflux at about 150° C. in an oil bath. During the reaction, the solution was also purged with nitrogen (or argon) to eliminate dissolved oxygen and to prevent the substrate from being oxidized. After the reaction, the substrate derivatized with VFc or FcA was rinsed with dichloromethane, acetonitrile and methanol, and dried under a stream of nitrogen gas. The derivatization of the H-terminated surface with ferrocene moieties as described in Example 2 is illustrated in FIG. 5.

후처리

  1. custombubbled with nitrogen or argon gas for at least 30 min
  2. customto react with VFc or FcA for about 12 h
  3. customDuring the reaction
  4. customthe solution was also purged with nitrogen (or argon)
  5. dissolutionto eliminate dissolved oxygen
  6. customAfter the reaction
  7. washwas rinsed with dichloromethane, acetonitrile and methanol
  8. customdried under a stream of nitrogen gas

출처 및 근거

ORD 기록
ord-5fc58a3dfce642d8ad8d587060914a99
출처 데이터셋
uspto-grants-2012_06
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US08197650B2

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