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Diethyl Oxalate → HCID 89370582, 화합물

HRID 2280862
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HRID 2280862 반응식
[Na].[CH2:2]=[C:3]1[CH2:6][CH:5]([C:7](=[O:9])[CH3:8])[CH2:4]1.[O-]CC.[Na+].[C:14](OCC)(=[O:20])[C:15]([O:17][CH2:18][CH3:19])=[O:16]>CCO>[CH2:2]=[C:3]1[CH2:6][CH:5]([C:7](=[O:9])[CH2:8][C:14](=[O:20])[C:15]([O:17][CH2:18][CH3:19])=[O:16])[CH2:4]1
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참가 물질

6

반응물 4

HCID 7268Diethyl OxalateHCID 2723922Sodium ethoxideHCID 5360545SodiumHCID 45084997Ethanone, 1-(3-methylenecyclobutyl)- (9CI)

생성물 1

HCID 89370582HCID 89370582, 화합물

시약·촉매·용매 1

HCID 702Ethanol용매2회

실험 절차

Sodium (1.15 g, 49.9 mmol) was dissolved in dry EtOH (30 mL, denaturated with 5% diethylether). Compound 8a (5.5 g, 49.9 mmol, crude) was dissolved in dry EtOH (45 mL) and the above prepared sodium ethoxide solution was added. This mixture was stirred at rt for 15 min and then diethyl oxalate (6.8 mL, 49.9 mmol) was added dropwise. The reaction mixture was placed in a pre-heated (to 67° C.) oil bath and stirred at this temperature for 4.5 h. The mixture was left at rt overnight. The solvent was removed, EA (100 mL) and 1 M HCl (70 mL) were added and organic phase was separated. The aq. phase was re-extracted with EA (50 mL). The combined organic phases were washed with water, brine and dried over anh. Na2SO4. The solvent was removed under reduced pressure and the residue was purified on silica using hexanes/MTBE 9:1 as eluent giving pure product 8b. Yield: 6.29 g, 56% over two steps. 1H-NMR (CDCl3), δ (ppm): 6.36 (s, 1H), 4.85-4.80 (m, 2H), 4.34 (q, J=8.0 Hz, 2H), 3.35-3.25 (m, 1H), 3.05-2.85 (m, 4H), 1.36 (t, J=8.0 Hz, 3H).

후처리

  1. additionwas added
  2. temperaturea pre-heated (to 67° C.) oil bath
  3. stirringstirred at this temperature for 4.5 h
  4. waitThe mixture was left at rt overnight
  5. customThe solvent was removed
  6. additionEA (100 mL) and 1 M HCl (70 mL) were added
  7. customorganic phase was separated
  8. extractionThe aq. phase was re-extracted with EA (50 mL)
  9. washThe combined organic phases were washed with water, brine
  10. dry with materialdried over anh. Na2SO4
  11. customThe solvent was removed under reduced pressure
  12. customthe residue was purified on silica

출처 및 근거

ORD 기록
ord-79ba2ce61ecd40538ddd16aa0df027ac
출처 데이터셋
uspto-grants-2015_09
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US09139539B2

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