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1-Methylimidazole → HCID 69540464, 화합물

HRID 2298570
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HRID 2298570 반응식
[NH:1]([C:10]([O:12][C:13]([CH3:16])([CH3:15])[CH3:14])=[O:11])[C@H:2]([C:7]([OH:9])=[O:8])[CH2:3][CH:4]([CH3:6])[CH3:5].CN1C=CN=C1.CC(OC([NH:30][C@@H:31](C(O)=O)[CH2:32][S:33][C:34]([C:47]1[CH:52]=[CH:51][CH:50]=[CH:49][CH:48]=1)(C1C=CC=CC=1)C1C=CC=CC=1)=O)(C)C.C1C=CC2N(O)N=NC=2C=1.CC(C)N=C=NC(C)C.[C:75](Cl)(=[O:82])C1C=CC=CC=1.CCN(C(C)C)C(C)C>ClCCl.ClCCl.CN(C=O)C>[C:10]([N:1]([C:34]1([C:47]2[CH:48]=[CH:49][C:50]([O:82][CH3:75])=[CH:51][CH:52]=2)[NH:30][CH2:31][CH2:32][S:33]1)[C@H:2]([C:7]([OH:9])=[O:8])[CH2:3][CH:4]([CH3:6])[CH3:5])([O:12][C:13]([CH3:14])([CH3:16])[CH3:15])=[O:11]
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

10

반응물 7

HCID 13901-MethylimidazoleHCID 7412Benzoyl chlorideHCID 12734DiisopropylcarbodiimideHCID 757711-HydroxybenzotriazoleHCID 81531DiisopropylethylamineHCID 83170L-Leucine, N-((1,1-dimethylethoxy)carbonyl)-HCID 11590774Boc-S-trityl-D-cysteine

생성물 1

HCID 69540464HCID 69540464, 화합물

시약·촉매·용매 2

HCID 6344Dichloromethane용매HCID 22350042dichloromethane N,N-dimethylformamide용매3회

실험 절차

The new linker based solid support 1 (1.0 g) having substitution 0.4 meq/g was placed in reaction vessel and allowed to swell in dichloromethane (DCM) under nitrogen stirring. After 30 min. the resin was filtered and washed with DCM. To this resin a solution of Boc-Leu (0.45 g, 2 mmol) dimethylaminopyridine (DMAP) or N-methyl imidazole (NMI) (0.4 mmol) in DCM:DMF (1:1) 20 ml and was added. The reaction mixture was stirred for 8-10 hrs. The resin was washed three times with DCM and dried. An aliquot of this dried resin (2.5 mg) was tested for the loading and the loading was found to be 82% [Method B]. The resin was treated with 50% TFA in DCM for 30 min. to remove Boc group. After 30 min the resin was filtered and washed with DCM 20 ml×3, 20% DIEA in DCM 20 ml×3, DCM 20 ml×3 and finally suspended in 20% piperidine solution DMF:DCM (1:1) 20 ml and treated with DCM:DMF (1:1) 20 ml. The resin having free amino group of Leu, was reacted with a solution of Boc-Cys-(Trt) (0.56 g, 1 mmol) and HOBt (0.153 g, 1 mmol) in DCM:DMF (1:1) 20 ml under nitrogen stirring. To this suspension DIC (0.18 ml, 1.2 mmol) was added and the mixture was stirred for 3 hrs until the resin was negative to Kaiser test. It was filtered and washed with DCM:DMF (1:1) 15 ml×3 and finally with DCM. The resin was treated with 50% trifluoroacetic acid (TFA)/Bu3SiH in DCM for 30 min and then washed with 10% trifluoric acid (TFA)/Bu3SiH in DCM for 10 min (three times) to remove both Boc and trytyl group of Cys. After washing the resin with DCM 3 times, a solution of p-anisaldehyde (0.5 ml) in DCM:DMF (1:1) 10 ml was added under stirring. The stirring was continued for 8-10 hrs. The resin was washed three times with DCM. To this resin, a solution of Benzoyl chloride (0.2 ml, 2 mmol) and DIEA (0.4 ml, 2.0 mmol) in DCM:DMF (1:1) 10 ml were added and the stirring were continued for three hrs. After three hours, the resin was negative to Kaiser test. The resin was washed with DCM:DMF (1:1) 10 ml×3, with DMF 10 ml×3, DCM:DMF (1:1) 10 ml×2 and finally three times with DCM and dried. It was treated with a mixture of dioxan-MeOH-4N. NaOH (30:9:1, 20 ml) for 30 min under stirring and the resin was filtered and washed with 2 ml of water. The combined filtrate was evaporated in vacuo. The residue was taken in water and extracted with ether. The aqueous layer acidified with 1N hydrochloric acid to pH 2.0 and extracted with EtOAc (3×70 ml). The combined EtOAc layer was washed with water and brine then dried over Na2SO4 and evaporated in vacuo to yield N-Boc-2-(4-methoxyphenyl)thiazolidinyl-leucine as a glassy material. Yield: 0.11 g, 78%; FAB-MS [M+H]+ 453; 1H NMR (DMSO-d6) δ: 0.9 (m, 6H), 1.2 (bs, 9H), 1.7 (m, 2H), 4.3 (m 1H), 3.5 (m, 2H), 3.7 (s, 3H), 4.86 (bs, 1H), 5.9 (bs, 1H), 6.8-7.1 (Abq, 4H).

후처리

  1. customwas placed in reaction vessel
  2. filtrationAfter 30 min. the resin was filtered
  3. washwashed with DCM
  4. washThe resin was washed three times with DCM
  5. customdried
  6. additionThe resin was treated with 50% TFA in DCM for 30 min.
  7. customto remove Boc group
  8. filtrationAfter 30 min the resin was filtered
  9. washwashed with DCM 20 ml×3, 20% DIEA in DCM 20 ml×3, DCM 20 ml×3
  10. additiontreated with DCM:DMF (1:1) 20 ml
  11. stirringthe mixture was stirred for 3 hrs until the resin
  12. filtrationIt was filtered
  13. washwashed with DCM:DMF (1:1) 15 ml×3 and finally with DCM
  14. additionThe resin was treated with 50% trifluoroacetic acid (TFA)/Bu3SiH in DCM for 30 min
  15. washwashed with 10% trifluoric acid (TFA)/Bu3SiH in DCM for 10 min (three times)
  16. customto remove both Boc and trytyl group of Cys
  17. washAfter washing the resin with DCM 3 times
  18. additiona solution of p-anisaldehyde (0.5 ml) in DCM:DMF (1:1) 10 ml was added
  19. stirringunder stirring
  20. waitThe stirring was continued for 8-10 hrs
  21. washThe resin was washed three times with DCM
  22. waitthe stirring were continued for three hrs
  23. waitAfter three hours
  24. washThe resin was washed with DCM:DMF (1:1) 10 ml×3, with DMF 10 ml×3, DCM:DMF (1:1) 10 ml×2 and finally three times with DCM
  25. customdried
  26. additionIt was treated with a mixture of dioxan-MeOH-4N
  27. stirringNaOH (30:9:1, 20 ml) for 30 min under stirring
  28. filtrationthe resin was filtered
  29. washwashed with 2 ml of water
  30. customThe combined filtrate was evaporated in vacuo
  31. extractionextracted with ether
  32. extractionextracted with EtOAc (3×70 ml)
  33. washThe combined EtOAc layer was washed with water and brine
  34. dry with materialthen dried over Na2SO4
  35. customevaporated in vacuo

출처 및 근거

ORD 기록
ord-d1485652785f4f15acba62dba1666486
출처 데이터셋
uspto-grants-2002_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US06492460B2

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