Hydrochloric Acid → HCID 178440879, 화합물

HRID 2373775노트

반응식

HRID 2373775 반응식
[C:1]([C:5]1[CH:6]=[C:7](C(C)C(O)=O)[CH:8]=[C:9]([C:12]([CH3:15])([CH3:14])[CH3:13])[C:10]=1[OH:11])([CH3:4])([CH3:3])[CH3:2].[NH2:21][CH2:22][C:23]1[CH:24]=[C:25]([NH:29][C:30]([C:32]2[S:33][CH:34]=[CH:35][CH:36]=2)=[NH:31])[CH:26]=[CH:27][CH:28]=1.Cl.[OH:38]N1C2C=CC=CC=2N=N1.Cl.CN(C)[CH2:51][CH2:52][CH2:53]N=C=NCC.CCN(CC)CC>C(Cl)Cl.O>[C:12]([C:9]1[CH:8]=[C:7]([CH2:53][CH2:52][C:51]([NH:21][CH2:22][C:23]2[CH:28]=[CH:27][CH:26]=[C:25]([NH:29][C:30](=[NH:31])[C:32]3[S:33][CH:34]=[CH:35][CH:36]=3)[CH:24]=2)=[O:38])[CH:6]=[C:5]([C:1]([CH3:4])([CH3:3])[CH3:2])[C:10]=1[OH:11])([CH3:15])([CH3:14])[CH3:13]

참가 물질

9

반응물 6

HCID 313Hydrochloric AcidHCID 8471TriethylamineHCID 757711-HydroxybenzotriazoleHCID 27239391,3-Propanediamine, N'-(ethylcarbonimidoyl)-N,N-dimethyl-, monohydrochlorideHCID 21692686HCID 21692686, 화합물HCID 178512010HCID 178512010, 화합물

생성물 1

HCID 178440879HCID 178440879, 화합물수율 85%

시약·촉매·용매 2

HCID 962Water용매HCID 6344Dichloromethane용매

반응 조건

온도
20 °C

실험 절차

To a solution of 2.78 g (10 mmol) of 3,5-di-tert-butyl-4-hydroxyphenylpropionic acid, 3.04 g (10 mmol) of N-[3-(aminomethyl)phenyl]thiophene-2-carboximidamide.2 HCl (J. Med. Chem. (1998), 41(15), 2858), 1.48; (11 mmol) of 1-hydroxybenzotriazole in 100 ml of CH2Cl2, in a 250 ml flask, 4.21 g (22 mmol) of 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride and 6.1 ml (44 mmol) of Et3N were added. After overnight stirring at 20° C., the reaction mixture was diluted with 100 ml water, stirred and decanted. The organic layer was successively washed with NaHCO3 saturated solution, water, KHSO4 (1M), water and brine. After drying over Na2SO4 and filtration, the organic solution was concentrated under reduced pressure. The residue was flash chromatographed over silica gel, using heptane/EtOAc: 1/1 as eluent, to yield a cream light solid (85%). Melting point: 163-164° C.

후처리

  1. stirringstirred
  2. customdecanted
  3. washThe organic layer was successively washed with NaHCO3 saturated solution, water, KHSO4 (1M), water and brine
  4. dry with materialAfter drying over Na2SO4 and filtration
  5. concentrationthe organic solution was concentrated under reduced pressure
  6. customchromatographed over silica gel

출처 및 근거

ORD 기록
ord-4b8afd3b71c447488a26c678072669d1
출처 데이터셋
uspto-grants-2008_12
특허 번호
US07459558B2

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