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tert-Butanol → HCID 21099527, 화합물

HRID 2377016
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HRID 2377016 반응식
Cl[S:2]([N:5]=C=O)(=[O:4])=[O:3].C(O)(C)(C)C.C(N(CC)CC)C.Cl.[F:21][C:22]1[CH:27]=[CH:26][C:25](/[CH:28]=[CH:29]/[C:30]2[CH:35]=[CH:34][C:33]([S:36]([C:39]3[CH:40]=[C:41]([NH2:45])[CH:42]=[CH:43][CH:44]=3)(=[O:38])=[O:37])=[CH:32][CH:31]=2)=[CH:24][CH:23]=1>ClCCl>[F:21][C:22]1[CH:23]=[CH:24][C:25](/[CH:28]=[CH:29]/[C:30]2[CH:31]=[CH:32][C:33]([S:36]([C:39]3[CH:40]=[C:41]([NH:45][S:2]([NH2:5])(=[O:4])=[O:3])[CH:42]=[CH:43][CH:44]=3)(=[O:38])=[O:37])=[CH:34][CH:35]=2)=[CH:26][CH:27]=1
참가 물질실험 절차후처리출처 및 근거반응 노트

참가 물질

6

반응물 4

HCID 6386tert-ButanolHCID 8471TriethylamineHCID 70918Chlorosulfonyl isocyanateHCID 21099488HCID 21099488, 화합물

생성물 1

HCID 21099527HCID 21099527, 화합물수율 36%

시약·촉매·용매 1

HCID 6344Dichloromethane용매

실험 절차

To dichloromethane (1 mL) at 0° C. was added chlorosulfonyl isocyanate (0.03 mL, 0.26 mmol) and tert-butanol (0.03 mL, 0.26 mmol). The mixture was stirred for 10 minutes then triethylamine (0.054 mL, 0.39 mmol) was added followed by [3-({4-[(E)-2-(4-fluorophenyl)vinyl]phenyl}sulfonyl)phenyl]amine hydrochloride (Example 212, 100 mg, 0.26 mmol). The reaction was allowed to warm to room temperature and stirred for 2 hours. The mixture was partitioned between ethyl acetate and water. The organic layer was washed with brine, dried over MgSO4 and evaporated. The residue was treated with trifluoroacetic acid for 15 minutes then evaporated. The residue was partitioned between ethyl acetate and 1M sodium hydroxide. The organic layer was washed with brine, dried over MgSO4 and evaporated. The residue was purified by flash column chromatography on silica, eluting with 50% ethyl acetate/isohexane to give the title compound (40 mg, 36%). δH (500 MHz, d6 DMSO): 9.94 (1H, s), 7.89 (2H, d, J=8.4 Hz), 7.79 (2H, d, J=8.4 Hz), 7.71-7.65 (3H, m), 7.51-7.48 (2H, m), 7.44-7.38 (2H, m), 7.30-7.20 (5H, m); m/z (ES+) 431 [MH+].

후처리

  1. stirringstirred for 2 hours
  2. customThe mixture was partitioned between ethyl acetate and water
  3. washThe organic layer was washed with brine
  4. dry with materialdried over MgSO4
  5. customevaporated
  6. additionThe residue was treated with trifluoroacetic acid for 15 minutes
  7. customthen evaporated
  8. customThe residue was partitioned between ethyl acetate and 1M sodium hydroxide
  9. washThe organic layer was washed with brine
  10. dry with materialdried over MgSO4
  11. customevaporated
  12. customThe residue was purified by flash column chromatography on silica
  13. washeluting with 50% ethyl acetate/isohexane

출처 및 근거

ORD 기록
ord-5e4eea1ccfa44cc5af8e47ec614c8260
출처 데이터셋
uspto-grants-2008_12
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US07468393B2

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