반응식
[CH2:1]([NH:4][CH:5]1[CH2:10][CH2:9][CH2:8][CH2:7][CH2:6]1)[CH:2]=[CH2:3].[CH3:11][SiH:12]([CH3:17])[O:13][SiH:14]([CH3:16])[CH3:15]>[H+].[H+].Cl[Pt-2](Cl)(Cl)(Cl)(Cl)Cl>[CH:5]1([NH:4][CH2:1][CH2:2][CH2:3][Si:12]([CH3:17])([CH3:11])[O:13][Si:14]([CH2:3][CH2:2][CH2:1][NH:4][CH:5]2[CH2:10][CH2:9][CH2:8][CH2:7][CH2:6]2)([CH3:16])[CH3:15])[CH2:10][CH2:9][CH2:8][CH2:7][CH2:6]1참가 물질
4
반응 조건
- 온도
- 110 °C
실험 절차
Following the technique described in Example 1, N-allylcyclohexylamine (0.173 mole), 1,1,3,3-tetramethyldisiloxane (0.0783 mole), and 0.05 g hexachloroplatinic acid are stirred at 70° C for eight hours at 110° C. under nitrogen. The product, in nearly quantitative yield, is purified by vacuum distillation at <1 torr at a temperature of 207°-210° C.
후처리
- distillationThe product, in nearly quantitative yield, is purified by vacuum distillation at <1 torr at a temperature of 207°-210° C.
출처 및 근거
- ORD 기록
- ord-c0289677df37416ba173f315dea44ca7
- 출처 데이터셋
- uspto-grants-1990_01
- 특허 번호
- US04892918
연결된 노트
불러오는 중…