Chlorotrimethylsilane → N-allyl-3-trimethylsilylpropiolic amide

HRID 370311

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HRID 370311 반응식
C(OCO[CH2:6][CH3:7])C.C([Li])CCC.C([N-]C(C)C)(C)C.[Li+].[CH2:21]([N:24]=[C:25]=[O:26])[CH:22]=[CH2:23].[CH3:27][Si:28](Cl)([CH3:30])[CH3:29]>C(OC)(C)(C)C.C1COCC1>[CH2:21]([NH:24][C:25](=[O:26])[C:7]#[C:6][Si:28]([CH3:30])([CH3:29])[CH3:27])[CH:22]=[CH2:23]

참가 물질

8

반응물 5

HCID 6397ChlorotrimethylsilaneHCID 10024DiethoxymethaneHCID 15123Allyl isocyanateHCID 2724682Lithium diisopropylamideHCID 178418339Butyllithium

생성물 1

HCID 11217610N-allyl-3-trimethylsilylpropiolic amide

시약·촉매·용매 2

HCID 8028Tetrahydrofuran용매HCID 15413tert-Butyl methyl ether용매

반응 조건

온도
0 °C

실험 절차

Preferred solvents include ethereals such as THF, diethoxymethane and t-butylmethyl ether. At about 0° C., a strong base is added dropwise over a period of about 15 minutes. Examples of strong bases are n-butyl lithium and lithium diisopropyl amide. While still maintaining the temperature near 0° C., a solution of allyl isocyanate in solvent is added dropwise over about 15 minutes. This is followed by the dropwise addition of trimethylsilyl chloride. After holding the reaction mixture at about 0 to about 10° C. for about 3 hours, the reaction is quenched with aqueous ammonium chloride and extracted with dichloromethane. The solvent is evaporated to yield the product, N-allyl-3-trimethylsilylpropiolic amide. ##STR8## wherein TMS is trimethylsilyl, the solvents are methylene chloride or DCE (1,2-dichloroethane), and the acid catalysts are aluminum chloride (AlCl3), ferric chloride (FeCl3) or methanesulfonic acid (MeSO3).

후처리

  1. additionAt about 0° C., a strong base is added dropwise over a period of about 15 minutes
  2. customat about 0 to about 10° C.
  3. customfor about 3 hours
  4. customthe reaction is quenched with aqueous ammonium chloride
  5. extractionextracted with dichloromethane
  6. customThe solvent is evaporated

출처 및 근거

ORD 기록
ord-767ac93444074d5292a52bfc631b232a
출처 데이터셋
uspto-grants-2000_10
특허 번호
US06140511

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