반응식
[Cl-].[CH3:2][SiH:3]([CH3:5])[CH3:4].[Cl:6][S:7]([OH:10])(=[O:9])=[O:8].Cl>ClC(Cl)C>[Cl:6][S:7]([O:10][Si:3]([CH3:5])([CH3:4])[CH3:2])(=[O:9])=[O:8]참가 물질
5
실험 절차
In a first step, a film of 100 cm2 with a thickness of 100 μm, dried beforehand at 110° C. under vacuum (10 mbar), was immersed in 200 ml of dichloroethane (DCE) and the whole mixture is brought to 60° C. In parallel, an anhydrous solution of trimethylsilyl chlorosulfonate was prepared by dissolving 47.2 g (0.434 moles) of trimethylsilane chloride and 42.2 g (0.36 moles) of ClSO3H, both the constituents being anhydrous, in 50 ml of dry DCE with magnetic stirring and under argon, for a duration of 30 minutes, with HCl formed being trapped.
후처리
- customIn a first step, a film of 100 cm2 with a thickness of 100 μm, dried beforehand at 110° C. under vacuum (10 mbar)
- customis brought to 60° C
- customformed
출처 및 근거
- ORD 기록
- ord-53da9787265543f092f804805d702865
- 출처 데이터셋
- uspto-grants-2013_02
- 특허 번호
- US08376149B2
연결된 노트
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