1,1,1-Trichloroethane → Methacrylic Acid

HRID 444585

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HRID 444585 반응식
[CH2:1]([O:3]CCO)C.CN(C1C=CC([C:16]([C:18]2[CH:19]=CC(N(C)C)=C[CH:23]=2)=[O:17])=CC=1)C.CN(C1C=CC(C(C2C=CC(N(C)C)=CC=2)C2C=CC(N(C)C)=CC=2)=CC=1)C.CC(Cl)(Cl)Cl>CC(=O)CC>[C:16]([O:3][CH3:1])(=[O:17])[C:18]([CH3:19])=[CH2:23].[C:16]([OH:3])(=[O:17])[C:18]([CH3:19])=[CH2:23]

참가 물질

7

실험 절차

A solution of 15 g of a 9:1 copolymer of methyl methacrylate and methacrylic acid in 30 g of 2-butanone was prepared by warming at 45° for 0.5 hr. To this solution was added 90 g of 2-ethoxyethanol, 15 g of Epocryl® 12, 1.2 g of 2-o-chlorophenyl-4,5-diphenylimidazolyl dimer, 0.9 g of Michler's ketone, 0.06 g of Leuco Crystal Violet, 0.30 g of C.I. Solvent Red Dye #109 and 10 g of methyl chloroform, and the mixture was dissolved by rolling for 1 hour. After standing overnight the solution was filtered, and it was spin-coated onto a 15×20 inch (38.1×50.8 cm) anodized aluminum substrate (275 rpm for 2.0 minutes). The coated plate was air-dried at 100° for 5 minutes to give a coating weight of 68.6 mg/dm2. The plate was exposed through a process transparency for 1.0 minute to a Xenon flash lamp under vacuum to give good contact with the process transparency. (A Xenon flash Nu Arc plate maker was employed at 1 mm pressure; GEPXA Xenon bulb with 2500 watt input at a distance of 16.5 inches (42 cm) from the photopolymerizable layer was used.) The exposed plate was developed for 15 seconds with the development solution of Example 1, and a printing press was used to print 5000 copies from this lithographic plate. Excellent prints were obtained with no evidence of plate wear, and excellent dot size reproduction was also obtained.

후처리

  1. temperatureby warming at 45° for 0.5 hr
  2. waitAfter standing overnight
  3. filtrationthe solution was filtered
  4. customanodized aluminum substrate (275 rpm for 2.0 minutes)
  5. customThe coated plate was air-dried at 100° for 5 minutes
  6. customto give a coating weight of 68.6 mg/dm2
  7. waitThe plate was exposed through a process transparency for 1.0 minute to a Xenon flash lamp under vacuum
  8. customto give good contact with the process transparency
  9. customExcellent prints were obtained with no evidence of plate wear, and excellent dot size reproduction
  10. customwas also obtained

출처 및 근거

ORD 기록
ord-d2f6a2529d2443bbb7f6a1be95c6eb68
출처 데이터셋
uspto-grants-1981_04
특허 번호
US04264708

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