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Hydrochloric Acid → 3,3-Bis(((1,1-dimethylethyl)dimethylsilyl)oxymethyl)cyclobutanone-O-methyl oxime

HRID 5965
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HRID 5965 반응식
[OH:1][CH2:2][C:3]1([CH2:11][OH:12])[CH2:6][C:5](OC)(OC)[CH2:4]1.Cl.[OH-].Cl.[O:16]([NH2:18])[CH3:17].[Si:19](Cl)([C:22]([CH3:25])([CH3:24])[CH3:23])([CH3:21])[CH3:20]>N1C=CC=CC=1.C1COCC1>[CH3:17][O:16][N:18]=[C:5]1[CH2:4][C:3]([CH2:2][O:1][Si:19]([C:22]([CH3:25])([CH3:24])[CH3:23])([CH3:21])[CH3:20])([CH2:11][O:12][Si:19]([C:22]([CH3:25])([CH3:24])[CH3:23])([CH3:21])[CH3:20])[CH2:6]1
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참가 물질

8

반응물 5

HCID 313Hydrochloric AcidHCID 961HydroxideHCID 28928tert-Butyldimethylsilyl chlorideHCID 521874O-Methylhydroxylamine hydrochlorideHCID 14862499[1-(Hydroxymethyl)-3,3-dimethoxycyclobutyl]methanol

생성물 1

HCID 197942523,3-Bis(((1,1-dimethylethyl)dimethylsilyl)oxymethyl)cyclobutanone-O-methyl oxime
수율 20%

시약·촉매·용매 2

HCID 1049Pyridine용매HCID 8028Tetrahydrofuran용매

실험 절차

3,3-Bis(hydroxymethyl)-1,1-dimethoxycyclobutane (1.35 g, 7.65 mmol) from Step A and 3.8 mL of 2M aqueous hydrochloric acid solution were added to 60 mL of THF and the reaction mixture was stirred at ambient temperature for 0.5 h, under a nitrogen atmosphere. The reaction mixture was neutralized by the addition of a strongly basic hydroxide resin then filtered and concentrated in vacuo. The residue was washed with THF and dissolved in 30 mL of anhydrous pyridine. To this solution was added 767 mg (9.2 mmol) of methoxylamine hydrochloride and the resultant solution was stirred for ~20 h at ambient temperature, under a nitrogen atmosphere. t-Butyldimethylsilyl chloride (3.5 g, 23 mmol) and 60 mL of anhydrous pyridine were then added and stirring continued overnight. The bulk of the solvent was evaporated in vacuo at 35°-40° C. and the concentrate dissolved in 200 mL of methylene chloride. The methylene chloride solution was washed with 100 mL of water, dried over anhydrous magnesium sulfate, filtered and concentrated in vacuo. The residue was purified on a 1.5×50 cm silica gel column eluted @ 5 psi with 200 mL of hexane, followed by 200 mL of 2% acetone in hexane, followed by 200 mL of 3% acetone in hexane, followed by 200 mL of 4% acetone in hexane and finally 200 mL of 10% acetone in hexane, to give 583 mg (20% yield) of the title compound; MS DCI-NH3M/Z: 388 (M+H)+ ; 1H NMR (CDCl3) δ 0.04 (s, 12H), 0.87 (s, 18H), 2.61 (d, 4H), 3.58 (s, 4H), 3.82 (s, 3H).

후처리

  1. filtrationthen filtered
  2. concentrationconcentrated in vacuo
  3. washThe residue was washed with THF
  4. dissolutiondissolved in 30 mL of anhydrous pyridine
  5. stirringstirring continued overnight
  6. customThe bulk of the solvent was evaporated in vacuo at 35°-40° C.
  7. dissolutionthe concentrate dissolved in 200 mL of methylene chloride
  8. washThe methylene chloride solution was washed with 100 mL of water
  9. dry with materialdried over anhydrous magnesium sulfate
  10. filtrationfiltered
  11. concentrationconcentrated in vacuo
  12. customThe residue was purified on a 1.5×50 cm silica gel column
  13. washeluted @ 5 psi with 200 mL of hexane

출처 및 근거

ORD 기록
ord-df3e718428eb4b82b1a1f65e66c2e7ef
출처 데이터셋
uspto-grants-1993_09
DOI
10.6084/m9.figshare.5104873.v1
특허 번호
US05246931

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