Hydrochloric Acid → HCID 178478463, 화합물

HRID 863739

반응식

HRID 863739 반응식
[Cl:1][CH2:2][CH2:3][CH2:4][CH2:5][C:6]#[N:7].[N-:8]=[N+:9]=[N-:10].[Na+].[Cl-].[Al+3].[Cl-].[Cl-].Cl>O1CCCC1.CCCCC>[Cl:1][CH2:2][CH2:3][CH2:4][CH2:5][C:6]1[NH:10][N:9]=[N:8][N:7]=1

참가 물질

7

반응물 4

HCID 313Hydrochloric AcidHCID 33557Sodium AzideHCID 804745-ChlorovaleronitrileHCID 6451240Aluminum(III) Chloride

생성물 1

HCID 178478463HCID 178478463, 화합물

시약·촉매·용매 2

HCID 8003Pentane용매HCID 8028Tetrahydrofuran용매

반응 조건

온도
80 °C

실험 절차

100mmol of 5-chlorovaleronitrile are placed under an inert atmosphere in 100 ml of anhydrous tetrahydrofuran on an ice bath. 445 mmol of sodium azide and then 100 mmol of aluminum chloride are then added in small fractions. The reaction mixture is heated to 80° C. and left under reflux, with stirring, for 16 hours. The complex formed is then hydrolyzed by addition, dropwise, of 150 cm3 of 5% hydrochloric acid. The resulting aqueous phase is extracted with ethyl acetate and after washing the organic phase with water, then with a saturated sodium chloride solution, drying and evaporation, the residue obtained is taken up in pentane. The expected product is then obtained after filtration of the precipitate formed.

후처리

  1. waitleft
  2. temperatureunder reflux
  3. customThe complex formed
  4. additionis then hydrolyzed by addition
  5. extractionThe resulting aqueous phase is extracted with ethyl acetate
  6. washafter washing the organic phase with water
  7. dry with materialwith a saturated sodium chloride solution, drying
  8. customevaporation
  9. customthe residue obtained

출처 및 근거

ORD 기록
ord-7c5079c0fe654c1b83febdf8eee3497c
출처 데이터셋
uspto-grants-1996_10
특허 번호
US05561113

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