Hydrochloric Acid → 6,6,6-Trifluoro-2-(3,3,3-trifluoropropylsulfonyl)-4-hexenenitrile

HRID 888328

반응식

HRID 888328 반응식
C1(C)C=CC(S(O[CH2:11][CH:12]=[CH:13][C:14]([F:17])([F:16])[F:15])(=O)=O)=CC=1.[F:19][C:20]([F:30])([F:29])[CH2:21][CH2:22][S:23]([CH2:26][C:27]#[N:28])(=[O:25])=[O:24].[H-].[Na+].Cl>O1CCCC1>[F:15][C:14]([F:17])([F:16])[CH:13]=[CH:12][CH2:11][CH:26]([S:23]([CH2:22][CH2:21][C:20]([F:19])([F:29])[F:30])(=[O:24])=[O:25])[C:27]#[N:28]

참가 물질

6

실험 절차

To a solution of 1.7 g of 4,4,4-Trifluoro-2-butenyl p-toluenesulfonate and 1.2 g of (3,3,3-trifluoropropylsulfonyl)acetonitrile in 30 ml of tetrahydrofuran, 0.2 g of sodium hydride (60% in oil) was added at room temperature, and stirred at the same temperature for 1 day. To the reaction mixture, 10% hydrochloric acid was added, followed by extraction with ethyl acetate. The organic layer was washed with a saturated sodium chloride aqueous solution, dried over anhydrous magnesium sulfate, and then concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 0.95 g of 6,6,6-trifluoro-2-(3,3,3-trifluoropropylsulfonyl)-4-hexenenitrile (hereinafter referred to as the present compound (19)).

후처리

  1. extractionfollowed by extraction with ethyl acetate
  2. washThe organic layer was washed with a saturated sodium chloride aqueous solution
  3. dry with materialdried over anhydrous magnesium sulfate
  4. concentrationconcentrated under reduced pressure

출처 및 근거

ORD 기록
ord-7787f3a4d5e04ff698a0fb73d60598a1
출처 데이터셋
uspto-grants-2012_08
특허 번호
US08247595B2

연결된 노트

불러오는 중…